Initial microstructural development of surface oxidized layer during silicon nitride oxidation

Resumo de eventos cient??ficos

Registro en:

http://repositorio.ipen.br/handle/123456789/22659

https://repositorioslatinoamericanos.uchile.cl/handle/2250/8985669

Autor

MORAIS, D.S.

BRESSIANI, A.H.A.

16th MEETING OF THE BRAZILIAN SOCIETY FOR ELECTRON MICROSCOPY

Institución

Instituto de Pesquisas Energéticas e Nucleares (Brasil)

Materias

silicon nitrides

aluminium oxides

rare earth compounds

x-ray diffraction

scanning electron microscopy

x-ray spectroscopy

yttrium silicates

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