Otro
CaCu3Ti4O12 thin films with non-linear resistivity deposited by RF-sputtering
Registro en:
Journal of Alloys and Compounds, v. 574, p. 604-608.
0925-8388
10.1016/j.jallcom.2013.05.216
WOS:000321749600097
2-s2.0-84879825033
Autor
Foschini, C. R.
Tararam, R.
Simões, A. Z.
Cilense, M.
Longo, Elson
Varela, José Arana
Resumen
Calcium copper titanate, CaCu3Ti4O12, CCTO, thin films with polycrystalline nature have been deposited by RF sputtering on Pt/Ti/SiO2/Si (100) substrates at a room temperature followed by annealing at 600 °C for 2 h in a conventional furnace. The CCTO thin film present a cubic structure with lattice parameter a = 7.379 ±0.001 Å free of secondary phases. The observed electrical features of CCTO thin films are highly dependent on the [CaO12], [CaO 4], [CuO11], [CuO11Vx 0] and [TiO5.VO] clusters. The CCTO film capacitor showed a dielectric loss of 0.40 and a dielectric permittivity of 70 at 1 kHz. The J-V behavior is completely symmetrical, regardless of whether the conduction is limited by interfacial barriers or by bulk-like mechanisms. © 2013 Elsevier B.V. All rights reserved.