Otro
Effects of post-annealing on the dielectric properties of Au/BaTiO3/Pt thin film capacitors
Registro en:
Materials Letters. Amsterdam: Elsevier B.V., v. 58, n. 11, p. 1715-1721, 2004.
0167-577X
10.1016/j.matlet.2003.10.047
WOS:000220244900011
Autor
Lee, EJH
Pontes, F. M.
Leite, E. R.
Longo, Elson
Magnani, R.
Pizani, P. S.
Varela, José Arana
Resumen
Barium titanate thin films were prepared by the polymeric precursor method and deposited onto Pt/Ti/SiO2/Si substrates. X-ray diffraction (XRD), scanning electron microscopy (SEM) and atomic force microscopy (AFM), Fourier transform infrared spectroscopy (FT-IR) and micro-Raman spectroscopy were used to investigate the formation of the BaTiO3 perovskite phase. Afterwards, the films were submitted to post-annealing treatments in oxygen and nitrogen atmospheres at 300 degreesC for 2 h, and had their dielectric properties measured. It was observed that the electric properties of the thin films are very sensitive to the nature of the post-annealing atmosphere. This study demonstrates that post-annealing in an oxygen atmosphere increases the dielectric relaxation phenomenon and that post-annealing in a nitrogen atmosphere produces a slight dielectric relaxation. (C) 2004 Elsevier B.V All rights reserved.