Resistencia a la corrosión de recubrimientos de TiAIVCuN depositados por la técnica de co-sputtering

dc.contributorOlaya Flórez, Jhon Jairo
dc.contributorMoreno, Carlos Mauricio
dc.contributorGrupo de Investigación en Corrosión, Tribologia y Energía
dc.creatorRodríguez Arévalo, Sergio Daniel
dc.date.accessioned2023-05-24T18:59:35Z
dc.date.available2023-05-24T18:59:35Z
dc.date.created2023-05-24T18:59:35Z
dc.date.issued2023
dc.identifierhttps://repositorio.unal.edu.co/handle/unal/83855
dc.identifierUniversidad Nacional de Colombia
dc.identifierRepositorio Institucional Universidad Nacional de Colombia
dc.identifierhttps://repositorio.unal.edu.co/
dc.description.abstractEn este trabajo se depositaron recubrimientos de TiAlVCuN sobre sustratos de acero inoxidable 316 L usando un sistema de cosputtering reactivo con fuentes HIPIMS y magnetrón. Como material de depósito se usó un blanco de titanio/aluminio y un blanco de vanadio/cobre. Los recubrimientos obtenidos fueron caracterizados química, microestructural y morfológicamente. La variación del voltaje de deposición en el blanco de V/Cu (con 5 niveles entre 510 V y 580 V), generó un cambio en la composición química representado principalmente en la variación de la cantidad de V, cambiando entre 3% y 12%. Estos recubrimientos exhibieron un crecimiento columnar, sin precipitaciones de Cu en la superficie. Además, se encontró una estructura cúbica tipo FCC, correspondiente con la formación de una solución sólida de TiAlVN sin presencia de Cu en estado metálico, por lo cual este probablemente podría estar disuelto en los bordes de grano de la matriz. Por otro lado, se evalúo la resistencia a la corrosión de los recubrimientos y el sustrato en dos tipos de electrolitos (Solución 3.5 wt. % de NaCl y Lactato de Ringer) a través de las técnicas de polarización potenciodinámica (TAFEL) y espectroscopia de impedancia electroquímica (EIS). El comportamiento frente a la corrosión mostrado por los recubrimientos fue similar al reportado para el sustrato. Sin embargo, el valor de la resistencia a la polarización disminuye con el aumento del voltaje de deposición. Lo anterior puede estar relacionado con un aumento en la cantidad de defectos presentes en el recubrimiento y la generación esfuerzos residuales que comprometen la adherencia de este al sustrato. (Texto tomado de la fuente)
dc.description.abstractIn this work TiAlVCuN coatings were deposited on 316 L stainless steel substrates using a reactive cosputtering system with magnetron and HIPIMS power sources. Titanium/aluminum and vanadium/copper blanks were used as deposit materials. The coatings obtained were chemically, microstructurally and morphologically characterized. The variation of the deposition voltage on the V/Cu target (with 5 levels between 510 V and 580 V), generated a change in the chemical composition represented mainly in the variation of the amount of V, changing between 3% and 12%. These coatings exhibited columnar growth, without Cu precipitation on the surface. In addition, an FCC-type cubic structure was found, corresponding to the formation of a TiAlVN solid solution without the presence of Cu in the metallic state, for which it could probably be dissolved at the grain boundaries of the matrix. On the other hand, coatings and substrate corrosion resistance was evaluated through the techniques of potentiodynamic polarization (TAFEL) and electrochemical impedance spectroscopy (EIS) using two types of electrolytes (3.5 wt. % NaCl NaCl solution and Ringer's Lactate). The corrosion behavior shown by the coatings was similar to that reported for the substrate. However, the polarization resistance value decreases with increasing deposition voltage. This could be related to an increase in the number of defects present in the coating and the generation of residual stresses that compromise its adherence to the substrate.
dc.languagespa
dc.publisherUniversidad Nacional de Colombia
dc.publisherBogotá - Ingeniería - Maestría en Ingeniería - Materiales y Procesos
dc.publisherFacultad de Ingeniería
dc.publisherBogotá, Colombia
dc.publisherUniversidad Nacional de Colombia - Sede Bogotá
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dc.rightsAtribución-NoComercial 4.0 Internacional
dc.rightshttp://creativecommons.org/licenses/by-nc/4.0/
dc.rightsinfo:eu-repo/semantics/openAccess
dc.titleResistencia a la corrosión de recubrimientos de TiAIVCuN depositados por la técnica de co-sputtering
dc.typeTrabajo de grado - Maestría


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