Enabling Solutions for 28nm CMOS Advanced Junction Formation
dc.creator | Li, C.I. | |
dc.creator | Kuo, P. | |
dc.creator | Lai, H.H. | |
dc.creator | Ma, K. | |
dc.creator | Liu, R. | |
dc.creator | Wu, H.H. | |
dc.creator | Chan, M. | |
dc.creator | Yang, C.L. | |
dc.creator | Wu, J.Y. | |
dc.creator | Arévalo, Edward | |
dc.creator | Guo, B.N. | |
dc.creator | Colombeau, B. | |
dc.creator | Thirumal, T. | |
dc.creator | Toh, T. | |
dc.creator | Shim, K.H. | |
dc.creator | Sun, H.L. | |
dc.creator | Wu, T. | |
dc.creator | Lu, S. | |
dc.date.accessioned | 2021-04-07T14:35:31Z | |
dc.date.available | 2021-04-07T14:35:31Z | |
dc.date.created | 2021-04-07T14:35:31Z | |
dc.date.issued | 2010 | |
dc.identifier | 0094-243X | |
dc.identifier | https://repositorio.uc.cl/handle/11534/57343 | |
dc.identifier | WOS:000288402500009 | |
dc.language | en | |
dc.rights | acceso restringido | |
dc.title | Enabling Solutions for 28nm CMOS Advanced Junction Formation | |
dc.type | comunicación de congreso |