Controle da pressão em um sistema de nitretação por plasma

Abstract

This work presents a solution to pressure control in a plasma nitriding system. The control is made by a valve between the chamber and a vacuum pump, the original valve was improved to become automatic, in addition, an electronic circuit was designed, the transfer function was identified and the PID controller was tuned by the CHR method. The mechanical adaptation, the electronic design of the circuit to control the position of the valve and the PID tuning is presented.