info:eu-repo/semantics/article
Thermodynamic conditions during growth determine the magnetic anisotropy in epitaxial thin-films of La0.7Sr0.3MnO3
Fecha
2016-07Registro en:
Vila Fungueiriño, J. M.; Bui, Cong Tinh; Rivas Murias, B.; Winkler, Elin Lilian; Milano, Julian; et al.; Thermodynamic conditions during growth determine the magnetic anisotropy in epitaxial thin-films of La0.7Sr0.3MnO3; IOP Publishing; Journal of Physics D: Applied Physics; 49; 31; 7-2016; 1-6
0022-3727
CONICET Digital
CONICET
Autor
Vila Fungueiriño, J. M.
Bui, Cong Tinh
Rivas Murias, B.
Winkler, Elin Lilian
Milano, Julian
Santiso, José
Rivadulla, F.
Resumen
The suitability of a particular material for use in magnetic devices is determined by the process of magnetization reversal/relaxation, which in turn depends on the magnetic anisotropy. Therefore, designing new ways to control magnetic anisotropy in technologically important materials is highly desirable. Here we show that magnetic anisotropy of epitaxial thin-films of half-metallic ferromagnet La0.7Sr0.3MnO3 (LSMO) is determined by the proximity to thermodynamic equilibrium conditions during growth. We performed a series of x-ray diffraction and ferromagnetic resonance (FMR) experiments in two different sets of samples: the first corresponds to LSMO thin-films deposited under tensile strain on (0 0 1) SrTiO3 by pulsed laser deposition (PLD; far from thermodynamic equilibrium); the second were deposited by a slow chemical solution deposition (CSD) method, under quasi-equilibrium conditions. Thin films prepared by PLD show fourfold in-plane magnetic anisotropy, with an overimposed uniaxial term. However, the uniaxial anisotropy is completely suppressed in the CSD films. This change is due to a different rotation pattern of MnO6 octahedra to accommodate epitaxial strain, which depends not only on the amplitude of tensile stress imposed by the STO substrate, but also on the growth conditions. Our results demonstrate that the nature and magnitude of the magnetic anisotropy in LSMO can be tuned by the thermodynamic parameters during thin-film deposition.