dc.contributorhttps://orcid.org/0000-0003-0087-8991
dc.creatorRodríguez Vargas, Isaac
dc.creatorGaggero Sager, Luís Manuel
dc.date.accessioned2018-08-13T16:15:31Z
dc.date.available2018-08-13T16:15:31Z
dc.date.created2018-08-13T16:15:31Z
dc.date.issued2006-02
dc.identifier‎0021-8979
dc.identifier1089-7550
dc.identifierhttp://hdl.handle.net/20.500.11845/632
dc.identifierhttps://doi.org/10.48779/de7x-8850
dc.description.abstractThe Thomas-Fermi approximation is implemented in two coupled n-type -doped quantum wells in Si. An analytical expression for the Hartree-Fock potential is obtained in order to compute the subband level structure. The longitudinal and transverse levels are obtained as a function of the impurity density and the interlayer distance. The exchange-correlation effects are analyzed from an impurity density of 8 1012 to 6.5 1013 cm−2. The transport calculations are based on a formula for the mobility, which allows us to discern the optimum distance between wells for maximum mobility.
dc.languageeng
dc.publisherAmerican Institute of Physics
dc.relationgeneralPublic
dc.relationhttps://aip.scitation.org/doi/10.1063/1.2168024
dc.rightshttp://creativecommons.org/licenses/by-nc-sa/3.0/us/
dc.rightsAtribución-NoComercial-CompartirIgual 3.0 Estados Unidos de América
dc.sourceJournal of Applied Physics Vol. 99, 2006
dc.titleSubband and transport calculations in double -type -doped quantum wells in Si
dc.typeinfo:eu-repo/semantics/article


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