dc.contributorhttps://orcid.org/0000-0003-0087-8991
dc.creatorRodríguez Vargas, Isaac
dc.creatorGaggero Sager, Luís Manuel
dc.date.accessioned2018-08-22T14:49:51Z
dc.date.available2018-08-22T14:49:51Z
dc.date.created2018-08-22T14:49:51Z
dc.date.issued2007-02-15
dc.identifier0921-4526
dc.identifierhttp://hdl.handle.net/20.500.11845/637
dc.identifierhttps://doi.org/10.48779/8zp5-2k08
dc.description.abstractWe present the electronic structure calculation of two closely p-type -doped quantum wells within the lines of the Thomas–Fermi–Dirac (TFD) theory. The distance between the impurity planes as well as the impurity density of the -doped wells is varied. The exchange effects are also considered in the present study. We have paid special attention to the split-off band and its influence on the subband hole levels. We also calculate the mobility ratio of double -doped (DDD) quantum wells in Si with respect to a single -doped (SDD) one, finding the optimum distance between the wells for maximum mobility. Our results are in a good agreement with respect to the experimental data available.
dc.languageeng
dc.publisherElsevier
dc.relationgeneralPublic
dc.relationhttps://ac.els-cdn.com/S0921452606014803/1-s2.0-S0921452606014803-main.pdf?_tid=b7a50a1a-2940-4ec8-b0a4-fbedcd23e5a5&acdnat=1534180833_239d79277fe180873d7b6e477b6b5f9a
dc.rightshttp://creativecommons.org/licenses/by-nc-sa/3.0/us/
dc.rightsAtribución-NoComercial-CompartirIgual 3.0 Estados Unidos de América
dc.sourcePhysica B: Condensed Matter Volume Vol. 389, No. 2, 15 de febrero, 2007, Pág. 227-233
dc.titleHole-level structure of double -doped quantum wells in Si: The influence of the split-off band
dc.typeinfo:eu-repo/semantics/article


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