dc.contributorUniversidade Estadual Paulista (Unesp)
dc.contributorUniversidade Estadual de Campinas (UNICAMP)
dc.date.accessioned2014-05-20T15:31:01Z
dc.date.accessioned2022-10-05T17:02:32Z
dc.date.available2014-05-20T15:31:01Z
dc.date.available2022-10-05T17:02:32Z
dc.date.created2014-05-20T15:31:01Z
dc.date.issued2012-02-01
dc.identifierIEEE Transactions on Plasma Science. Piscataway: IEEE-Inst Electrical Electronics Engineers Inc, v. 40, n. 2, p. 492-496, 2012.
dc.identifier0093-3813
dc.identifierhttp://hdl.handle.net/11449/40277
dc.identifier10.1109/TPS.2011.2178272
dc.identifierWOS:000300429800011
dc.identifier0000-0002-4511-3768
dc.identifier.urihttp://repositorioslatinoamericanos.uchile.cl/handle/2250/3911281
dc.description.abstractThis paper describes a new plasma treatment method: the plasma expander. In this approach, expanding shock waves are generated in a vacuum chamber by pulsed plasmas. Collisions of fast species in the waves modify the properties of solid surfaces exposed to the plasma. The degree of such modification is governed by the energy delivered by the plasma exposure. To confirm the efficacy of this approach, modifications induced in the properties of thin polymer films produced by plasma-enhanced chemical vapor deposition by exposure to nitrogen plasma shock waves were investigated. The films were prepared from benzene radio frequency plasmas and subsequently exposed to different quantities of nitrogen shock waves N-w. The effects of N-w on the wettability, molecular structure, and mechanical properties of the films were studied. Fourier transform infrared spectroscopy revealed that greater N-w resulted in the loss of C-H groups and the rupture of benzene aromatic rings observed in the structure of the as-deposited films. Furthermore, the contact angle strongly increased and the hardness, evaluated by nanoindentation, increased up to fourfold with the increase in the intensity of the treatment.
dc.languageeng
dc.publisherInstitute of Electrical and Electronics Engineers (IEEE)
dc.relationIEEE Transactions on Plasma Science
dc.relation1.253
dc.relation0,522
dc.rightsAcesso restrito
dc.sourceWeb of Science
dc.subjectPlasma-enhanced chemical vapor deposition (PECVD)
dc.subjectplasma expander
dc.subjectplasma treatment
dc.subjectsurface treatment
dc.subjectthin films
dc.titleA Novel Plasma Technique for Surface Treatment: The Plasma Expander
dc.typeArtigo


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