NICKEL TROPOLONATE COMPLEXES AS PRECURSORS FOR THE DIRECT PHOTODEPOSITION OF NiO THIN FILMS

dc.creatorBuono-Core,G.E
dc.creatorTejos,M
dc.creatorSchrebler,R
dc.creatorKlahn,A.H
dc.creatorHill,R.H
dc.date2004-09-01
dc.date.accessioned2017-03-07T15:36:21Z
dc.date.available2017-03-07T15:36:21Z
dc.identifierhttp://www.scielo.cl/scielo.php?script=sci_arttext&pid=S0717-97072004000300006
dc.identifier.urihttp://repositorioslatinoamericanos.uchile.cl/handle/2250/387986
dc.descriptionIn this paper we report the obtention of amorphous and nanostructured thin films of NiO, through the direct photolysis of the Ni(II)diaquabis(t-amyltropolonate) complex. Surface morphology observed by scanning electron microscopy showed uniform films of excellent quality, without islands or other imperfections. Purity and composition of the films was determined by X-ray difraction and Auger spectroscopy showing that the main product of photolysis is NiO. Sputtering with Ar ions reduces the oxide to Ni(0) and decreases significantly the carbon contamination of the films
dc.formattext/html
dc.languageen
dc.publisherSociedad Chilena de Química
dc.sourceJournal of the Chilean Chemical Society v.49 n.3 2004
dc.subjectThin films
dc.subjectnickel thin film
dc.subjectnickel oxides
dc.subjectnickel terc-amyltropolonate
dc.titleNICKEL TROPOLONATE COMPLEXES AS PRECURSORS FOR THE DIRECT PHOTODEPOSITION OF NiO THIN FILMS
dc.typeArtículos de revistas


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