Obtención y caracterización de películas nanoestructuradas de austenita expandida depositadas sobre acero inoxidable empleando la técnica de pulverización catódica magnetrón cc en fase reactiva

dc.contributorGarzón Ospina, Carlos Mario
dc.contributorMicroscopía eléctrónica
dc.creatorVergara Lozano, Giovanny Andrés
dc.date.accessioned2020-07-02T20:32:20Z
dc.date.available2020-07-02T20:32:20Z
dc.date.created2020-07-02T20:32:20Z
dc.date.issued2019
dc.identifierhttps://repositorio.unal.edu.co/handle/unal/77731
dc.description.abstractPor medio de pulverización catódica en atmósfera reactiva se depositaron películas nanoestructuradas, cristalinas y sin nitruros de cromo, sobre sustratos de acero utilizando un blanco del acero austenítico UNS S31603. Estas presentaron estructura ferrítica, austenítica, dúplex (ferrita + austenita) o nitruro MN (M: metal), dependiendo de los parámetros de operación del reactor y del flujo de N2. La concentración de nitrógeno varió desde cero (Ar 1,2 sccm) hasta cerca de 50 %-at (Ar 1,2 sccm + N2 11,2 sccm). La dureza de las películas estuvo entre 8 – 13 GPa, mientras la dureza del blanco fue 2 – 3 GPa. El carácter dúctil – frágil de las películas varió, desde ductilidad muy elevada hasta comportamiento frágil ante cargas de indentación. De forma similar, se obtuvieron películas con elevada adherencia y baja cohesión al sustrato. Este trabajo propone un análisis para explicar la dependencia entre los parámetros de operación del reactor, la estructura, las propiedades mecánicas y las adherencias observadas.
dc.description.abstractStainless Steel (SS) crystalline films, with no chromium nitride formation, were deposited on SS substrates by reactive sputtering, using a UNS S31603 target. Films obtained showed different structures, namely ferrite, austenite, duplex (ferrite + austenite) and MN nitride, according to both operational reactor parameters and N2 flow rate. Nitrogen uptake in film varied between N-lean films (Ar 1,2 sccm) up to near 50 %-at N (Ar 1,2 sccm + N2 11,2 sccm). Films hardness varied 8-13 GPa, while target hardness was around 2 – 3 GPa. Film ductile vs fragile character varied from very high ductile films, up to films with fragile performance films under contact indentation loads. In a similar manner, film-substrate adherence varied from extremely high up to films with cohesive failure, in both micro-indentation and scratch test. In this research, a depth analysis of sputtering parameters, film structure, and film tribomechanical performance is presented.
dc.languagespa
dc.publisherBogotá - Ingeniería - Maestría en Ingeniería - Materiales y Procesos
dc.publisherUniversidad Nacional de Colombia - Sede Bogotá
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dc.rightsAtribución-NoComercial-SinDerivadas 4.0 Internacional
dc.rightsAcceso abierto
dc.rightshttp://creativecommons.org/licenses/by-nc-nd/4.0/
dc.rightsinfo:eu-repo/semantics/openAccess
dc.rightsDerechos reservados - Universidad Nacional de Colombia
dc.titleObtención y caracterización de películas nanoestructuradas de austenita expandida depositadas sobre acero inoxidable empleando la técnica de pulverización catódica magnetrón cc en fase reactiva
dc.typeOtro


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