Effect of the plasma composition on the structural and electronic properties of as-grown SiOx/Si heterolayers depositedby reactive sputtering

dc.date.accessioned2013-01-16T08:52:32Z
dc.date.available2013-01-16T08:52:32Z
dc.date.created2013-01-16T08:52:32Z
dc.date.issued2013-01-16
dc.identifierhttp://www.repositoriodigital.ipn.mx/handle/123456789/10661
dc.publisherInstitute of Physics
dc.subjectSiOx
dc.subjectSi
dc.titleEffect of the plasma composition on the structural and electronic properties of as-grown SiOx/Si heterolayers depositedby reactive sputtering
dc.typeArticle


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