A modification of close-space vapor transport combined with free evaporation technique for doping semiconductor films and production of interfaces

dc.date.accessioned2013-01-16T08:46:57Z
dc.date.available2013-01-16T08:46:57Z
dc.date.created2013-01-16T08:46:57Z
dc.date.issued2013-01-16
dc.identifierhttp://www.repositoriodigital.ipn.mx/handle/123456789/10650
dc.publisherSociedad Mexicana de Fisica
dc.subjectdoping
dc.subjectsemiconductor
dc.titleA modification of close-space vapor transport combined with free evaporation technique for doping semiconductor films and production of interfaces
dc.typeArticle


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