dc.creatorOrdonez, C. A.
dc.creatorBickel, D. R.
dc.creatorVenezia, V. C.
dc.creatorMcDaniel, F. D.
dc.creatorMalteson, S. E.
dc.creatorMolina Gálvez, Mario
dc.date.accessioned2018-12-20T14:28:44Z
dc.date.available2018-12-20T14:28:44Z
dc.date.created2018-12-20T14:28:44Z
dc.date.issued1999
dc.identifierJournal of Nuclear Materials, Volumen 264, Issue 1-2, 2018, Pages 133-140
dc.identifier00223115
dc.identifier10.1016/S0022-3115(98)00479-6
dc.identifierhttp://repositorio.uchile.cl/handle/2250/156127
dc.description.abstractElectronic ion energy loss calculations on the basis of the binary encounter approximation are presented for protons in oxygen, nitrogen and silicon. Calculations using both an analytical approach as well as a Monte Carlo approach are found to agree well with experimental data even down to energies below the stopping cross section maximum. Energy loss calculations for protons in silicon under channeling conditions are included and predictions are made for channeling in the 〈110〉 direction at low energies (5-500 keV). © 1999 Elsevier Science B.V. All rights reserved.
dc.languageen
dc.publisherElsevier
dc.rightshttp://creativecommons.org/licenses/by-nc-nd/3.0/cl/
dc.rightsAttribution-NonCommercial-NoDerivs 3.0 Chile
dc.sourceJournal of Nuclear Materials
dc.subjectNuclear and High Energy Physics
dc.subjectMaterials Science (all)
dc.subjectNuclear Energy and Engineering
dc.titleElectronic ion energy loss calculations on the basis of the binary encounter approximation
dc.typeArtículos de revistas


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