Preliminary characterization of a Plasma Focus device used as pulsed ion implanter

Abstract

Focus device on a cost effective basis. High energy ion beam emission is one, among several others, of the very interesting transient plasmas phenomena observed in plasma focus discharge. In the last decade the plasma focus device has been succesfully used as a pulsed energetic ion source for material processing. We present a preliminary characterization of Plasma Focus device (PF), designed and constructed in the Universidad de Antofagasta, intended as a ion implanter device. The PF is a Mather-type and operates in the range of low energy (500 J to 1 kJ). The studies have focused on electrical characterization of the bank and optimization of the discharge between the electrodes, operating with hydrogen at low pressure (about mbar). Preliminary ion measurements have been made with Faraday cup. Others diagnostic used in the experiments, include current derivative and high voltage monitor.