Studies on scalability and scaling laws for the plasma focus: similarities and differences in devices from 1MJ to 0.1J

dc.creatorSoto, L.
dc.creatorVeloso Espinosa, Felipe Eduardo
dc.date.accessioned2016-05-10T18:16:31Z
dc.date.available2016-05-10T18:16:31Z
dc.date.created2016-05-10T18:16:31Z
dc.date.issued2010
dc.identifier0963-0252
dc.identifierhttps://repositorio.uc.cl/handle/11534/14059
dc.languageen
dc.relationPlasma Sources Science & Technology No. 5 (19), p. 1-9.
dc.rightsacceso restringido
dc.titleStudies on scalability and scaling laws for the plasma focus: similarities and differences in devices from 1MJ to 0.1J
dc.typeartículo


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