Artículos de revistas
Strain relaxation and stress-driven interdiffusion in InAs/InGaAs/InP nanowires
Registro en:
Applied Physics Letters. Amer Inst Physics, v. 91, n. 6, 2007.
0003-6951
WOS:000248661400128
10.1063/1.2764446
Autor
Nieto, L
Bortoleto, JRR
Cotta, MA
Magalhaes-Paniago, R
Gutierrez, HR
Institución
Resumen
The authors have investigated strain relaxation in InAs/InGaAs/InP nanowires (NW's). Transmission electron microscopy images show an additional stress field attributed to compositional modulation in the ternary layer, which disrupts NW formation and drives Ga interdiffusion into InAs, according to grazing incidence x-Ray diffraction under anomalous scattering conditions. The strain profile along the NW, however, is not significantly affected when interdiffusion is considered. Results show that the InAs NW energetic stability is preserved with the introduction of ternary buffer layer in the structure. (c) 2007 American Institute of Physics. 91 6