Artículos de revistas
ANODIC NIOBIUM PENTOXIDE FILMS - GROWTH AND THICKNESS DETERMINATION BY INSITU OPTOELECTROCHEMICAL MEASUREMENTS
Registro en:
Electrochimica Acta. Pergamon-elsevier Science Ltd, v. 36, n. 8, n. 1297, n. 1300, 1991.
0013-4686
WOS:A1991FX08000007
10.1016/0013-4686(91)80008-V
Autor
JULIAO, JF
CHAGAS, JWR
CESAR, HL
DIAS, NL
DECKER, F
GOMES, UU
Institución
Resumen
Data on optical reflectance and anodization voltage, obtained during the galvanostatic anodization of metallic niobium foils in an H3PO4(1%) solution at room temperature were simultaneously recorded as a function of time, to determine the thickness of the Nb2O5 films formed. From these data, plots of film thickness vs anodization voltage were obtained. A linear relation was always observed and in all cases but one, an angular coefficient of 22 angstrom V-1 was verified. 36 8 1297 1300