Artículos de revistas
RADIO-FREQUENCY SPUTTERED COBALT OXIDE COATING - STRUCTURAL, OPTICAL, AND ELECTROCHEMICAL CHARACTERIZATION
Registro en:
Journal Of Applied Physics. Amer Inst Physics, v. 74, n. 9, n. 5835, n. 5841, 1993.
0021-8979
WOS:A1993MG59700082
10.1063/1.354203
Autor
ESTRADA, W
FANTINI, MCA
DECASTRO, SC
DAFONSECA, CNP
GORENSTEIN, A
Institución
Resumen
Cobalt oxide thin films (thickness 2000 angstrom) with different stoichiometries were deposited by reactive rf sputtering. The variation of the oxygen partial pressure lead to films with compositions varying from metallic cobalt to CO3O4, as determined by x-ray diffraction and x-ray photoelectron spectroscopy. The electrochromic properties of the films were investigated in aqueous electrolytes (0.1 M KOH). The initial electrochemical behavior of the films is strongly dependent on the film deposition conditions, but after cycling the electrochemical/electrochromic characteristics of the different deposits were quite similar. Transmittance changes and electrochromic efficiency are discussed. 74 9 5835 5841