dc.creatorESTRADA, W
dc.creatorFANTINI, MCA
dc.creatorDECASTRO, SC
dc.creatorDAFONSECA, CNP
dc.creatorGORENSTEIN, A
dc.date1993
dc.date37196
dc.date2014-12-16T11:37:42Z
dc.date2015-11-26T16:26:46Z
dc.date2014-12-16T11:37:42Z
dc.date2015-11-26T16:26:46Z
dc.date.accessioned2018-03-28T23:07:37Z
dc.date.available2018-03-28T23:07:37Z
dc.identifierJournal Of Applied Physics. Amer Inst Physics, v. 74, n. 9, n. 5835, n. 5841, 1993.
dc.identifier0021-8979
dc.identifierWOS:A1993MG59700082
dc.identifier10.1063/1.354203
dc.identifierhttp://www.repositorio.unicamp.br/jspui/handle/REPOSIP/58804
dc.identifierhttp://www.repositorio.unicamp.br/handle/REPOSIP/58804
dc.identifierhttp://repositorio.unicamp.br/jspui/handle/REPOSIP/58804
dc.identifier.urihttp://repositorioslatinoamericanos.uchile.cl/handle/2250/1268989
dc.descriptionCobalt oxide thin films (thickness 2000 angstrom) with different stoichiometries were deposited by reactive rf sputtering. The variation of the oxygen partial pressure lead to films with compositions varying from metallic cobalt to CO3O4, as determined by x-ray diffraction and x-ray photoelectron spectroscopy. The electrochromic properties of the films were investigated in aqueous electrolytes (0.1 M KOH). The initial electrochemical behavior of the films is strongly dependent on the film deposition conditions, but after cycling the electrochemical/electrochromic characteristics of the different deposits were quite similar. Transmittance changes and electrochromic efficiency are discussed.
dc.description74
dc.description9
dc.description5835
dc.description5841
dc.languageen
dc.publisherAmer Inst Physics
dc.publisherWoodbury
dc.relationJournal Of Applied Physics
dc.relationJ. Appl. Phys.
dc.rightsaberto
dc.sourceWeb of Science
dc.subjectElectrochromic Behavior
dc.subjectFilms
dc.subjectNickel
dc.subjectManganese
dc.subjectWindow
dc.subjectWo3
dc.titleRADIO-FREQUENCY SPUTTERED COBALT OXIDE COATING - STRUCTURAL, OPTICAL, AND ELECTROCHEMICAL CHARACTERIZATION
dc.typeArtículos de revistas


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