Artículos de revistas
Optical Emission End Point Detecting For Monitoring Oxygen Plasma A-c:h Stripping
Registro en:
Vacuum. , v. 49, n. 3, p. 213 - 215, 1998.
0042207X
2-s2.0-0000816313
Autor
Alves M.A.R.
Da Silva Braga E.
Fissore A.
Cescato L.
Institución
Resumen
The stripping of amorphous hydrogenated carbon films (a-C:H) using an rf oxygen plasma has been monitored using the optical emission from electronically excited CO, H and O species in the visible region of the spectrum. The end point has been detected by monitoring the emission intensity of O reactive species (777.2 nm) and CO emission (483.5 nm) intensity of the etching product. © 1998 Elsevier Science Ltd. All rights reserved. 49 3 213 215 Holland, L., Ojha, S.M., (1976) Thin Solid Films, 38, pp. L17-L19 Holland, L., Ojha, S.M., (1979) Thin Solid Films, 58, p. 107 Angus, J.C., Koidl, P., Domitz, S., (1986) Plasma Deposited Thin Films, , eds. J. Mort and F. Jansen Chemical Rubber, Boca Raton, FL Bubenzer, A., Dischler, B., Brandt, G., Koidl, P., (1983) J. Appl. Phys., 54, p. 4590 Kakuchi, M., Hikita, M., Tamamura, T., (1986) Appl. Phys. Lett., 48, p. 835 Kragler, K., Günther, E., Leuschner, R., Falk, G., Hammerschmidt, A., Seggern, H., Von Saemann-Ischenko, G., (1995) Appl. Phys. Lett., 67, p. 1163