| dc.creator | Alves M.A.R. | |
| dc.creator | Da Silva Braga E. | |
| dc.creator | Fissore A. | |
| dc.creator | Cescato L. | |
| dc.date | 1998 | |
| dc.date | 2015-06-30T15:07:13Z | |
| dc.date | 2015-11-26T15:20:01Z | |
| dc.date | 2015-06-30T15:07:13Z | |
| dc.date | 2015-11-26T15:20:01Z | |
| dc.date.accessioned | 2018-03-28T22:29:32Z | |
| dc.date.available | 2018-03-28T22:29:32Z | |
| dc.identifier | | |
| dc.identifier | Vacuum. , v. 49, n. 3, p. 213 - 215, 1998. | |
| dc.identifier | 0042207X | |
| dc.identifier | | |
| dc.identifier | http://www.scopus.com/inward/record.url?eid=2-s2.0-0000816313&partnerID=40&md5=af04543b2248820c591c30b2001bdd7d | |
| dc.identifier | http://www.repositorio.unicamp.br/handle/REPOSIP/100722 | |
| dc.identifier | http://repositorio.unicamp.br/jspui/handle/REPOSIP/100722 | |
| dc.identifier | 2-s2.0-0000816313 | |
| dc.identifier.uri | http://repositorioslatinoamericanos.uchile.cl/handle/2250/1259879 | |
| dc.description | The stripping of amorphous hydrogenated carbon films (a-C:H) using an rf oxygen plasma has been monitored using the optical emission from electronically excited CO, H and O species in the visible region of the spectrum. The end point has been detected by monitoring the emission intensity of O reactive species (777.2 nm) and CO emission (483.5 nm) intensity of the etching product. © 1998 Elsevier Science Ltd. All rights reserved. | |
| dc.description | 49 | |
| dc.description | 3 | |
| dc.description | 213 | |
| dc.description | 215 | |
| dc.description | Holland, L., Ojha, S.M., (1976) Thin Solid Films, 38, pp. L17-L19 | |
| dc.description | Holland, L., Ojha, S.M., (1979) Thin Solid Films, 58, p. 107 | |
| dc.description | Angus, J.C., Koidl, P., Domitz, S., (1986) Plasma Deposited Thin Films, , eds. J. Mort and F. Jansen Chemical Rubber, Boca Raton, FL | |
| dc.description | Bubenzer, A., Dischler, B., Brandt, G., Koidl, P., (1983) J. Appl. Phys., 54, p. 4590 | |
| dc.description | Kakuchi, M., Hikita, M., Tamamura, T., (1986) Appl. Phys. Lett., 48, p. 835 | |
| dc.description | Kragler, K., Günther, E., Leuschner, R., Falk, G., Hammerschmidt, A., Seggern, H., Von Saemann-Ischenko, G., (1995) Appl. Phys. Lett., 67, p. 1163 | |
| dc.language | en | |
| dc.publisher | | |
| dc.relation | Vacuum | |
| dc.rights | fechado | |
| dc.source | Scopus | |
| dc.title | Optical Emission End Point Detecting For Monitoring Oxygen Plasma A-c:h Stripping | |
| dc.type | Artículos de revistas | |
