Artículos de revistas
Photolysis Wavelength Dependence Of The Effect Of Xenon On The Production Of C2*(d̃3iig) By Ultraviolet Multiphoton Dissociation
Registro en:
Journal Of Physical Chemistry. , v. 86, n. 13, p. 2271 - 2273, 1982.
223654
2-s2.0-5544271126
Autor
Lin C.T.
Avouris Ph.
Thefaine Y.J.
Institución
Resumen
We report on the effect of Xe buffer gas on the C2(d̃3IIg→ã3II u) emission which results from the excimer laser-induced multiphonon fragmentation of acetylene, triethylenediamine (Dabco), and benzene. We find that, upon addition of Xe, normal quenching of this emission occurs for 248-nm (KrF) photolysis of the above molecules, while an unusual enhancement is found for 193-nm (ArF) photolysis. Other radical emissions resulting from the same process, e.g., CH(Ã2Δ→X̃2II) and CN(B̃2Σ+→X̃2Σ +), show normal quenching at both wavelengths. The possible mechanisms of this unusual enhancement are discussed. © 1982 American Chemical Society. 86 13 2271 2273