Photolysis Wavelength Dependence Of The Effect Of Xenon On The Production Of C2*(d̃3iig) By Ultraviolet Multiphoton Dissociation

dc.creatorLin C.T.
dc.creatorAvouris Ph.
dc.creatorThefaine Y.J.
dc.date1982
dc.date2015-06-30T13:44:07Z
dc.date2015-11-26T14:39:38Z
dc.date2015-06-30T13:44:07Z
dc.date2015-11-26T14:39:38Z
dc.date.accessioned2018-03-28T21:45:25Z
dc.date.available2018-03-28T21:45:25Z
dc.identifier
dc.identifierJournal Of Physical Chemistry. , v. 86, n. 13, p. 2271 - 2273, 1982.
dc.identifier223654
dc.identifier
dc.identifierhttp://www.scopus.com/inward/record.url?eid=2-s2.0-5544271126&partnerID=40&md5=065acc7b58adfeb9a50b351ce0672ed1
dc.identifierhttp://www.repositorio.unicamp.br/handle/REPOSIP/98760
dc.identifierhttp://repositorio.unicamp.br/jspui/handle/REPOSIP/98760
dc.identifier2-s2.0-5544271126
dc.identifier.urihttp://repositorioslatinoamericanos.uchile.cl/handle/2250/1250075
dc.descriptionWe report on the effect of Xe buffer gas on the C2(d̃3IIg→ã3II u) emission which results from the excimer laser-induced multiphonon fragmentation of acetylene, triethylenediamine (Dabco), and benzene. We find that, upon addition of Xe, normal quenching of this emission occurs for 248-nm (KrF) photolysis of the above molecules, while an unusual enhancement is found for 193-nm (ArF) photolysis. Other radical emissions resulting from the same process, e.g., CH(Ã2Δ→X̃2II) and CN(B̃2Σ+→X̃2Σ +), show normal quenching at both wavelengths. The possible mechanisms of this unusual enhancement are discussed. © 1982 American Chemical Society.
dc.description86
dc.description13
dc.description2271
dc.description2273
dc.languageen
dc.publisher
dc.relationJournal of Physical Chemistry
dc.rightsfechado
dc.sourceScopus
dc.titlePhotolysis Wavelength Dependence Of The Effect Of Xenon On The Production Of C2*(d̃3iig) By Ultraviolet Multiphoton Dissociation
dc.typeArtículos de revistas


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