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Stability of the Photocatalytic Activity of TiO2 Deposited by Reactive Sputtering
(ABM, ABC, ABPol, 2021-07-05)
The photocatalytic activity and stability of TiO2 thin films deposited by reactive sputtering were evaluated through many cycles of aqueous methylene blue solutions photodegradation. Tests were performed in TiO2 films ...
Estudo sobre a formação da solução sólida em filmes finos de zrn+si depositados via magnetron sputtering reativoStudy on the formation of the solid solution in zrn+si thin films deposited via reactive magnetron sputtering
(Pós-Graduação em Ciência e Engenharia de MateriaisUniversidade Federal de Sergipe (UFS), 2023)
Nanocrystalline carbon flakes deposited by RF magnetron sputtering
(Elsevier, 2016)
Carbon nanostructures were prepared by RF magnetron sputtering at deposition times from 30 to 120 min and temperatures on silicon substrates from 390 degrees C to 510 degrees C. Scanning and transmission electron microscopy ...
Microstructure and composition design of magnetic Ni-Mn-Sn Co-sputter deposited films
(SCIENCEDOMAIN international, 2015)
Influence of deposition parameters on the properties of Ag-C films deposited by rf magnetron sputtering
(Universidad Nacional de Ingeniería, 2019)
Low-temperature deposition of silicon oxide and silicon nitride by reactive magnetron sputtering
(ELSEVIER SCI LTD, 2009)
In this study, oxide and nitride films were deposited at room temperature through the reaction of silicon Sputtered by argon and oxygen ions or argon and nitrogen ions at 250 and 350 W with 0.67 Pa pressure. It was observed ...
Improvements of plasma immersion ion implantation (PIII) and deposition (PIII&D) processing for materials surface modification
(2013-08-25)
Plasma immersion ion implantation (PIII) process is a three dimensional surface modification method that is quite mature and well known to the surface engineering community nowadays, especially to those working in the field ...
Improvements of plasma immersion ion implantation (PIII) and deposition (PIII&D) processing for materials surface modification
(2013-08-25)
Plasma immersion ion implantation (PIII) process is a three dimensional surface modification method that is quite mature and well known to the surface engineering community nowadays, especially to those working in the field ...