dc.contributor | Universidade Estadual Paulista (UNESP) | |
dc.creator | Pontes, D. S. L. | |
dc.creator | Chiquito, A. J. | |
dc.creator | Pontes, F. M. | |
dc.creator | Longo, E. | |
dc.date | 2015-03-18T15:53:33Z | |
dc.date | 2016-10-25T20:25:09Z | |
dc.date | 2015-03-18T15:53:33Z | |
dc.date | 2016-10-25T20:25:09Z | |
dc.date | 2014-10-05 | |
dc.date.accessioned | 2017-04-06T07:04:11Z | |
dc.date.available | 2017-04-06T07:04:11Z | |
dc.identifier | Journal Of Alloys And Compounds. Lausanne: Elsevier Science Sa, v. 609, p. 33-39, 2014. | |
dc.identifier | 0925-8388 | |
dc.identifier | http://hdl.handle.net/11449/116586 | |
dc.identifier | http://acervodigital.unesp.br/handle/11449/116586 | |
dc.identifier | 10.1016/j.jallcom.2014.04.132 | |
dc.identifier | WOS:000336606000006 | |
dc.identifier | http://dx.doi.org/10.1016/j.jallcom.2014.04.132 | |
dc.identifier.uri | http://repositorioslatinoamericanos.uchile.cl/handle/2250/927233 | |
dc.description | Ferroelectric thin films and LaNiO3 (LNO) metallic conductive oxide thin films were prepared by a chemical solution deposition (CSD) method. PBCT60, PBST60 and PCST60 ferroelectric thin films were grown on different structures such as LNO/Si and single-crystalline quartz SiO2 (X-cut) substrates. The LNO layer acts as the bottom electrode for the electrical measurements. X-ray diffraction (XRD) analysis shows that LNO thin films on Si substrates and PBCT60, PBST60 and PCST60 thin films on LNO/Si structures are poly-crystalline with a moderate (110)-texture and a complete perovskite phase. LNO, PBCT60, PBST60 and PCST60 thin films have a continuous, dense and homogenous microstructure with a grain size on the order of 50-80 nm. Electrical resistivity-dependence temperature data confirm that LNO thin films display a good metallic character over a wide large range of temperatures. Optical characteristics of PBCT60, PBST60 and PCST60 thin films have also been investigated using ultraviolet-visible (UV-vis) spectroscopy in the wavelength range of 200-1100 nm. Ferroelectric thin films show a direct allowed optical transition with optical band gap values on the of order of 3.54, 3.66 and 3.89 eV for PBCT60, PCST60 and PBST60 thin films deposited on a SiO2 substrate, respectively. Good dielectric and ferroelectric properties are reported for ferroelectric thin films deposited on the LNO layer as bottom electrodes. Au/PBCT60/LNO/Si, Au/PBST60/LNO/Si and Au/PCST60/LNO/Si multilayer structures show a hysteresis loop with remnant polarization, P-r, of 9.6, 6.6 and 4.2 mu C/cm(2) at an applied voltage of 6 V for PBCT60, PBST60 and PCST60 thin films, respectively. (C) 2014 Elsevier B.V. All rights reserved. | |
dc.description | Fundação de Amparo à Pesquisa do Estado de São Paulo (FAPESP) | |
dc.description | Conselho Nacional de Desenvolvimento Científico e Tecnológico (CNPq) | |
dc.language | eng | |
dc.publisher | Elsevier B.V. | |
dc.relation | Journal Of Alloys And Compounds | |
dc.rights | info:eu-repo/semantics/closedAccess | |
dc.subject | Thin films | |
dc.subject | LaNiO3 | |
dc.subject | Electrical properties | |
dc.subject | Chemical solution deposition | |
dc.title | Structural, dielectric, ferroelectric and optical properties of PBCT, PBST and PCST complex thin films on LaNiO3 metallic conductive oxide layer coated Si substrates by the CSD technique | |
dc.type | Otro | |