Estudo da decomposição fotoquímica por exposição à luz UV de fotorresinas positivas

Photodecomposition by ultraviolet exposure of positive photoresists

dc.creatorBorges, Bruno Gabriel Alves Leite
dc.creatorRocco, Maria Luiza Miranda
dc.creatorPinho, Roberto Rosas
dc.creatorLima, Carlos Raimundo
dc.date2018-12-18T13:05:10Z
dc.date2018-12-18
dc.date2018-12-18T13:05:10Z
dc.date2012
dc.date.accessioned2023-09-29T16:43:21Z
dc.date.available2023-09-29T16:43:21Z
dc.identifierhttp://dx.doi.org/10.1590/S0100-40422012000200016
dc.identifierhttps://repositorio.ufjf.br/jspui/handle/ufjf/8306
dc.identifier.urihttps://repositorioslatinoamericanos.uchile.cl/handle/2250/9138185
dc.descriptionPositive photoresists are widely used in lithographic process in microelectronics and in optics for the fabrication of relief components. With the aim of identifying molecular modifications among positive photoresists unexposed and previously exposed to ultraviolet light the electron stimulated ion desorption technique coupled to time-of-flight mass spectrometry was employed in the study of the AZ-1518 photoresist. Mass spectra were obtained as a function of the electron beam energy, showing specific changes related to the photochemical decomposition of the photoresist. This reinforces the applicability of the technique to investigate and characterize structural changes in photosensitive materials.
dc.description-
dc.formatapplication/pdf
dc.languagepor
dc.publisher-
dc.publisherBrasil
dc.publisher-
dc.relationQuímica Nova
dc.rightsAcesso Aberto
dc.subjectAZ-1518 photoresist
dc.subjectPhotolysis
dc.subjectTime-of-flight mass spectrometry
dc.subject-
dc.titleEstudo da decomposição fotoquímica por exposição à luz UV de fotorresinas positivas
dc.titlePhotodecomposition by ultraviolet exposure of positive photoresists
dc.typeArtigo de Periódico


Este ítem pertenece a la siguiente institución