Evaluation of carbon thin films using raman spectroscopy

dc.creatorSILVA, DANILO L.C. e
dc.creatorKASSAB, LUCIANA R.P.
dc.creatorSANTOS, ANTONIO D. dos
dc.creatorPILLIS, MARINA F.
dc.date2018
dc.date2018-12-10T15:10:32Z
dc.date2018-12-10T15:10:32Z
dc.date.accessioned2023-09-28T14:08:59Z
dc.date.available2023-09-28T14:08:59Z
dc.identifier1516-1439
dc.identifierhttp://repositorio.ipen.br/handle/123456789/29346
dc.identifier4
dc.identifier21
dc.identifier10.1590/1980-5373-MR-2017-0787
dc.identifieraguardando
dc.identifier16.894
dc.identifier47.75
dc.identifier.urihttps://repositorioslatinoamericanos.uchile.cl/handle/2250/8999588
dc.descriptionCarbon thin films deposited by the magnetron sputtering technique were evaluated by Raman spectroscopy to study the influence on their crystallinity caused by different parameters like the carbon deposition time, the different buffer-layers and substrates employed and also two distinct heat treatments. The present results showed that the choice of these parameters plays an important role in the production of these films. The results also indicate the possibility of using the technique for the production of carbon thin films to be employed in future in applications with controlled content of structural defects, predominance of ordered sp2 bondings and tendency of graphitization.
dc.relationMaterials Research
dc.rightsopenAccess
dc.subjectthin films
dc.subjectsputtering
dc.subjectgraphite
dc.subjectraman spectroscopy
dc.subjectcarbon
dc.subjectmagnetrons
dc.titleEvaluation of carbon thin films using raman spectroscopy
dc.typeArtigo de peri??dico
dc.coverageI


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