dc.contributorUniversidade Estadual Paulista (UNESP)
dc.creatorJiménez Pérez, J. L.
dc.creatorSakanaka, P. H.
dc.creatorAlgatti, M. A.
dc.creatorMendoza-Alvarez, J. G.
dc.creatorCruz Orea, A.
dc.date2014-05-27T11:20:16Z
dc.date2016-10-25T18:17:03Z
dc.date2014-05-27T11:20:16Z
dc.date2016-10-25T18:17:03Z
dc.date2001-05-15
dc.date.accessioned2017-04-06T00:59:36Z
dc.date.available2017-04-06T00:59:36Z
dc.identifierApplied Surface Science, v. 175-176, p. 709-714.
dc.identifier0169-4332
dc.identifierhttp://hdl.handle.net/11449/66522
dc.identifierhttp://acervodigital.unesp.br/handle/11449/66522
dc.identifier10.1016/S0169-4332(01)00144-1
dc.identifierWOS:000169032100116
dc.identifier2-s2.0-16644370473
dc.identifierhttp://dx.doi.org/10.1016/S0169-4332(01)00144-1
dc.identifier.urihttp://repositorioslatinoamericanos.uchile.cl/handle/2250/888079
dc.descriptionThis paper presents the theoretical and experimental results for oxide thin film growth on titanium films previously deposited over glass substrate. Ti films of thickness 0.1 μm were heated by Nd:YAG laser pulses in air. The oxide tracks were created by moving the samples with a constant speed of 2 mm/s, under the laser action. The micro-topographic analysis of the tracks was performed by a microprofiler. The results taken along a straight line perpendicular to the track axis revealed a Gaussian profile that closely matches the laser's spatial mode profile, indicating the effectiveness of the surface temperature gradient on the film's growth process. The sample's micro-Raman spectra showed two strong bands at 447 and 612 cm -1 associated with the TiO 2 structure. This is a strong indication that thermo-oxidation reactions took place at the Ti film surface that reached an estimated temperature of 1160 K just due to the action of the first pulse. The results obtained from the numerical integration of the analytical equation which describes the oxidation rate (Wagner equation) are in agreement with the experimental data for film thickness in the high laser intensity region. This shows the partial accuracy of the one-dimensional model adopted for describing the film growth rate. © 2001 Elsevier Science B.V.
dc.languageeng
dc.relationApplied Surface Science
dc.rightsinfo:eu-repo/semantics/closedAccess
dc.subjectLaser materials processing
dc.subjectLaser-induced oxidation
dc.subjectThin oxide films
dc.subjectMathematical models
dc.subjectNeodymium lasers
dc.subjectOxides
dc.subjectPulsed laser applications
dc.subjectThermooxidation
dc.subjectThin films
dc.subjectTitanium
dc.subjectLaser heating
dc.subjectLaser induced oxidation
dc.subjectFilm growth
dc.titleOne-dimensional analytical model for oxide thin film growth on Ti metal layers during laser heating in air
dc.typeOtro


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