Deposition of SiOx Thin Films on Y-TZP by Reactive Magnetron Sputtering: Influence of Plasma Parameters on the Adhesion Properties Between Y-TZP and Resin Cement for Application in Dental Prosthesis

dc.contributorUniversidade Estadual Paulista (UNESP)
dc.creatorCalvacanti de Queiroz, Jose Renato
dc.creatorDuarte, Diego Alexandre
dc.creatorde Assuncao e Souza, Rodrigo Othavio
dc.creatorFissmer, Sara Fernanda
dc.creatorMassi, Marcos
dc.creatorBottino, Marco Antonio
dc.date2014-05-20T14:05:09Z
dc.date2016-10-25T17:10:37Z
dc.date2014-05-20T14:05:09Z
dc.date2016-10-25T17:10:37Z
dc.date2011-04-01
dc.date.accessioned2017-04-05T21:34:03Z
dc.date.available2017-04-05T21:34:03Z
dc.identifierMaterials Research-ibero-american Journal of Materials. São Carlos: Universidade Federal de São Carlos (UFSCar), Dept Engenharia Materials, v. 14, n. 2, p. 212-216, 2011.
dc.identifier1516-1439
dc.identifierhttp://hdl.handle.net/11449/22850
dc.identifierhttp://acervodigital.unesp.br/handle/11449/22850
dc.identifier10.1590/S1516-14392011005000032
dc.identifierS1516-14392011005000032
dc.identifierWOS:000292723200012
dc.identifierhttp://dx.doi.org/10.1590/S1516-14392011005000032
dc.identifier.urihttp://repositorioslatinoamericanos.uchile.cl/handle/2250/868201
dc.descriptionIn this paper SiOx thin films were deposited on Y-TZP ceramics by reactive magnetron sputtering technique in order to improve the adhesion properties between Y-TZP and resin cement for applications in dental prosthesis. For fixed cathode voltage, target current, working pressure and target-to-substrate distance, SiOx thin films were deposited at different oxygen concentrations in the Ar+O-2 plasma forming gas. After deposition processes, SiOx thin films were characterized by profilometry, energy dispersive spectroscopy (EDS), optical microscopy and scanning electron microscopy (SEM). Adhesion properties between Y-TZP and resin cement were evaluated by shear testing. Results indicate that films deposited at 20%O-2 increased the bond strength to (32.8 +/- 5.4) MPa. This value has not been achieved by traditional methods.
dc.descriptionFundação de Amparo à Pesquisa do Estado de São Paulo (FAPESP)
dc.descriptionConselho Nacional de Desenvolvimento Científico e Tecnológico (CNPq)
dc.descriptionCoordenação de Aperfeiçoamento de Pessoal de Nível Superior (CAPES)
dc.languageeng
dc.publisherUniversidade Federal de São Carlos (UFSCar), Dept Engenharia Materials
dc.relationMaterials Research-ibero-american Journal of Materials
dc.rightsinfo:eu-repo/semantics/openAccess
dc.subjectY-TZP
dc.subjectdental material
dc.subjectthin films
dc.subjectsilicon oxide
dc.titleDeposition of SiOx Thin Films on Y-TZP by Reactive Magnetron Sputtering: Influence of Plasma Parameters on the Adhesion Properties Between Y-TZP and Resin Cement for Application in Dental Prosthesis
dc.typeOtro


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