dc.creatorSchmidt, Anelise Marlene
dc.creatorAzambuja, Denise Schermann
dc.date2011-06-10T06:00:05Z
dc.date2010
dc.identifier1516-1439
dc.identifierhttp://hdl.handle.net/10183/29490
dc.identifier000775094
dc.descriptionThe effect of fluoride ions concentration on the electrochemical behavior of Ti grade 2 and Ti6Al4V in citrate buffers was studied. Open circuit potential (OCP) measurements and voltammetric studies of the samples in the fluoride containing citrate buffers revealed a dissolution process when the pH falls below 5.0 and the NaF content is higher than 0.01 M. However, in citrate pH 7.6 the materials showed a passive behavior even in 0.1 M NaF. Some micrographs of Ti grade 2 obtained after longer immersion times in citrate pH 5.0 with 0.01 M NaF showed a surface attack. EIS (Electrochemical Impedance Sprectroscopy) data obtained at the OCP revealed that the film resistance decreases when the immersion time is increased in pH 5.0 containing 0.1 M NaF. In the citrate pH 7.6 the EIS data indicated a two-layer model of an oxide film consisting of a more compact inner layer and a porous outer layer. On the other hand, the EIS results in citrate pH 4.0 change significantly when the fluoride ions concentration increases from 0.01 to 0.05 M. The electrochemical data revealed that the corrosion behavior of Ti grade 2 and Ti6Al4V in the citrate buffers depends on the pH, the fluoride content and the exposure time.
dc.formatapplication/pdf
dc.languageeng
dc.relationMaterials research: ibero-american journal of materials. São Carlos, SP. Vol. 13, no.1 (Jan./Mar. 2010), p. 45-50
dc.rightsOpen Access
dc.subjectTitânio
dc.subjectFluoreto
dc.subjectCitrato
dc.subjectCorrosão
dc.subjectTi
dc.subjectTi6Al4V
dc.subjectCitrate
dc.subjectFluoride
dc.titleCorrosion behavior of Ti and Ti6A14V in citrate buffers containing fluoride ions
dc.typeArtigo de periódico
dc.typeNacional


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