Composition and emission characterization and computational simulation of silicon rich oxide films obtained by LPCVD

dc.creatorMARIANO ACEVES MIJARES
dc.creatorSERGIO ROMAN LOPEZ
dc.date2013-03-10
dc.date.accessioned2023-07-25T16:25:18Z
dc.date.available2023-07-25T16:25:18Z
dc.identifierhttp://inaoe.repositorioinstitucional.mx/jspui/handle/1009/2278
dc.identifier.urihttps://repositorioslatinoamericanos.uchile.cl/handle/2250/7807457
dc.descriptionSilicon rich oxide (SRO) is a silicon compatible material that could solve the light emission limitation inherent to bulk silicon. However, not many applications are yet reported, since still much research has to be done. In this paper, SRO superficial films were obtained by low pressure chemical vapor deposition. Structural and optical characterization was done by X-ray photoelectron spectroscopy and Fourier transform infrared spectroscopy (FTIR) corroborating that after annealing, the SiO and the Si₂O phase clearly increases. Emission of SRO in the range between ultra violet and near-infrared is determined by photo, electro and cathode luminescence. Assuming that emission is due to agglomerates of Si–O compounds, computational simulations of cyclic chains of SiO were done to calculate the FTIR spectra, emission and HOMO-LUMO densities. It was found that emission of molecules with less than 10 silicon atoms is not likely to be present in the annealed films. However, for molecules with more than 13 silicon atoms, the emission extends to the visible and near infrared region. The calculated FTIR agrees with the experimental results. Copyright © 2013 John Wiley & Sons, Ltd.
dc.formatapplication/pdf
dc.languageeng
dc.publisherSurface and Interface Analysis,
dc.relationcitation:Aceves-Mijares, M., et al., (2013), Composition and emission characterization and computational simulation of silicon rich oxide films obtained by LPCVD, Surface and Interface Analysis, Vol. 46(4):216-223
dc.rightsinfo:eu-repo/semantics/openAccess
dc.rightshttp://creativecommons.org/licenses/by-nc-nd/4.0
dc.subjectinfo:eu-repo/classification/Inspec/Photo
dc.subjectinfo:eu-repo/classification/Inspec/Electro and cathode luminescence
dc.subjectinfo:eu-repo/classification/Inspec/SRO films
dc.subjectinfo:eu-repo/classification/Inspec/DFT
dc.subjectinfo:eu-repo/classification/Inspec/Moieties
dc.subjectinfo:eu-repo/classification/cti/1
dc.subjectinfo:eu-repo/classification/cti/22
dc.subjectinfo:eu-repo/classification/cti/2203
dc.subjectinfo:eu-repo/classification/cti/2203
dc.titleComposition and emission characterization and computational simulation of silicon rich oxide films obtained by LPCVD
dc.typeinfo:eu-repo/semantics/article
dc.typeinfo:eu-repo/semantics/acceptedVersion
dc.audiencestudents
dc.audienceresearchers
dc.audiencegeneralPublic


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