dc.creatorWilliam Wenceslao Hernández Montero
dc.creatorIgnacio Enrique Zaldívar Huerta
dc.creatorCARLOS ZUÑIGA ISLAS
dc.creatorALFONSO TORRES JACOME
dc.creatorCLAUDIA REYES BETANZO
dc.date2012-04
dc.date.accessioned2023-07-25T16:25:00Z
dc.date.available2023-07-25T16:25:00Z
dc.identifierhttp://inaoe.repositorioinstitucional.mx/jspui/handle/1009/2122
dc.identifier.urihttps://repositorioslatinoamericanos.uchile.cl/handle/2250/7807303
dc.descriptionWe report the study of hydrogenated amorphous silicon-germanium (a-Si1-xXGex:H) films prepared by low-frequency plasma-enhanced chemical vapor deposition (LF-PECVD) varying the composition (0 ≤ X ≤ 1). Silicon and germanium content is determined by energy dispersion spectroscopy (EDS). Refractive index, absorption coefficient and optical gap are estimated by transmittance measurements as well as by the use of PUMA software. Absorption coefficients obtained by using this software and by the Beer-Lambert law show good agreement according to absorption region. Results indicate that refractive index exhibits a linear behavior on germanium content for atomic percent (at.%). Employing these films and by the use of the finite-element software COMSOL, a single-mode low-contrast rib optical waveguide operating at the wavelength of 1550 nm is simulated, and later fabricated by using photolithography and plasma etching techniques. Measured optical losses are 7.6 dB/cm.
dc.formatapplication/pdf
dc.languageeng
dc.publisherOptical Materials Express
dc.relationcitation:Hernández-Montero,William W., et al., (2012), Optical and compositional properties of amorphous silicon-germanium films by plasma processing for integrated photonics, Optical Materials Express, Vol. 2(4):358–370
dc.rightsinfo:eu-repo/semantics/openAccess
dc.rightshttp://creativecommons.org/licenses/by-nc-nd/4.0
dc.subjectinfo:eu-repo/classification/Inspec/Photonic integrated circuits
dc.subjectinfo:eu-repo/classification/Inspec/Waveguides
dc.subjectinfo:eu-repo/classification/Inspec/Thinfilms, Optical properties
dc.subjectinfo:eu-repo/classification/Inspec/Semiconductor materials
dc.subjectinfo:eu-repo/classification/Inspec/Plasmas
dc.subjectinfo:eu-repo/classification/cti/1
dc.subjectinfo:eu-repo/classification/cti/22
dc.subjectinfo:eu-repo/classification/cti/2203
dc.subjectinfo:eu-repo/classification/cti/2203
dc.titleOptical and compositional properties of amorphous silicon-germanium films by plasma processing for integrated photonics
dc.typeinfo:eu-repo/semantics/article
dc.typeinfo:eu-repo/semantics/acceptedVersion
dc.audiencestudents
dc.audienceresearchers
dc.audiencegeneralPublic


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