Deposition and characterization of polymorphous germanium films prepared by low frequency PECVD

dc.creatorMARIO MORENO MORENO
dc.creatorALFONSO TORRES JACOME
dc.creatorPedro Rosales Quintero
dc.creatorANDREY KOSAREV
dc.creatorCARLOS ZUÑIGA ISLAS
dc.creatorCLAUDIA REYES BETANZO
dc.creatorMiguel Dominguez
dc.date2012
dc.date.accessioned2023-07-25T16:24:57Z
dc.date.available2023-07-25T16:24:57Z
dc.identifierhttp://inaoe.repositorioinstitucional.mx/jspui/handle/1009/2101
dc.identifier.urihttps://repositorioslatinoamericanos.uchile.cl/handle/2250/7807282
dc.descriptionIn this work we have deposited polymorphous germanium (pm-Ge:H) thin films by low frequency plasma enhanced chemical vapor deposition (LF-PECVD). We have studied the effect of the deposition pressure on the structural and electric characteristics of the films. Atomic force microscopy was used to analyze the surface roughness of the pm-Ge:H films, while transmission electron microscopy was used to observe the cross section. The temperature dependence of conductivity (σ(T)), deposition rate (Vd), activation energy (Ea) and the temperature coefficient of resistance (TCR) were extracted on the pm-Ge:H films deposited at different pressure values. An optimal pressure range was found, in order to produce pm-Ge:H films with high Ea and TCR which are key parameters for thermal detection applications.
dc.formatapplication/pdf
dc.languageeng
dc.publisherJournal of Non-Crystalline Solids
dc.relationcitation:Moreno, M., et al., (2012), Deposition and characterization of polymorphous germanium films prepared by low frequency PECVD, Journal of Non-Crystalline Solids, Vol. 358:(17) 2099–2102
dc.rightsinfo:eu-repo/semantics/openAccess
dc.rightshttp://creativecommons.org/licenses/by-nc-nd/4.0
dc.subjectinfo:eu-repo/classification/Inspec/Polymorphous
dc.subjectinfo:eu-repo/classification/Inspec/Germanium
dc.subjectinfo:eu-repo/classification/Inspec/Amorphous
dc.subjectinfo:eu-repo/classification/Inspec/Plasma
dc.subjectinfo:eu-repo/classification/Inspec/PECVD
dc.subjectinfo:eu-repo/classification/cti/1
dc.subjectinfo:eu-repo/classification/cti/22
dc.subjectinfo:eu-repo/classification/cti/2203
dc.subjectinfo:eu-repo/classification/cti/2203
dc.titleDeposition and characterization of polymorphous germanium films prepared by low frequency PECVD
dc.typeinfo:eu-repo/semantics/article
dc.typeinfo:eu-repo/semantics/acceptedVersion
dc.audiencestudents
dc.audienceresearchers
dc.audiencegeneralPublic


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