a-Si:H crystallization from isothermal annealing and its dependence on the substrate used

dc.creatorABDU ORDUÑA DIAZ
dc.creatorRAUL JACOBO DELGADO MACUIL
dc.creatorVALENTIN LOPEZ GAYOU
dc.creatorMARTHA DOLORES BIBBINS MARTINEZ
dc.creatorALFONSO TORRES JACOME
dc.creatorCARLOS GERARDO TREVIÑO PALACIOS
dc.date2010
dc.date.accessioned2023-07-25T16:23:50Z
dc.date.available2023-07-25T16:23:50Z
dc.identifierhttp://inaoe.repositorioinstitucional.mx/jspui/handle/1009/1530
dc.identifier.urihttps://repositorioslatinoamericanos.uchile.cl/handle/2250/7806721
dc.descriptionWe present hydrogenated amorphous silicon (a-Si:H) films which were deposited on two different substrates (glass and mono-crystalline silicon) after an isothermal annealing treatment at 250 ◦C for up to 14 h. The annealed amorphous films were analyzed using atomic force microscopy, Raman and FTIR spectroscopy. Films deposited on glass substrate experienced an amorphous–crystalline phase transition after annealing because of the metal-induced crystallization effect, reaching approximately 70% conversion after 14 h of annealing. An absorption frequency of the TO-phonon mode that varies systematically with the substoichiometry of the silicon oxide in the 1046–1170cm−1 region was observed, revealing the reactivity of the film with the annealing time. For similar annealing time, films deposited on mono-crystalline silicon substrate remained mainly amorphous with minimal Si-crystalline formation. Therefore, the crystalline formations and the shape of the films surfaces depends on the annealing time as well as on the substrate employed during the deposition process of the a-Si:H film.
dc.formatapplication/pdf
dc.languageeng
dc.publisherElsevier B.V.
dc.relationcitation:Rojas-López, M., et al., (2010). a-Si:H crystallization from isothermal annealing and its dependence on the substrate used, Materials Science and Engineering B, (174): 137–140
dc.rightsinfo:eu-repo/semantics/openAccess
dc.rightshttp://creativecommons.org/licenses/by-nc-nd/4.0
dc.subjectinfo:eu-repo/classification/Amorphous silicon/Amorphous silicon
dc.subjectinfo:eu-repo/classification/Microcrystalline silicon/Microcrystalline silicon
dc.subjectinfo:eu-repo/classification/Metal-induced crystallization/Metal-induced crystallization
dc.subjectinfo:eu-repo/classification/cti/1
dc.subjectinfo:eu-repo/classification/cti/22
dc.subjectinfo:eu-repo/classification/cti/2203
dc.subjectinfo:eu-repo/classification/cti/2203
dc.titlea-Si:H crystallization from isothermal annealing and its dependence on the substrate used
dc.typeinfo:eu-repo/semantics/article
dc.typeinfo:eu-repo/semantics/acceptedVersion
dc.audiencestudents
dc.audienceresearchers
dc.audiencegeneralPublic


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