dc.creatorMARIO MORENO MORENO
dc.creatorANDREY KOSAREV
dc.creatorALFONSO TORRES JACOME
dc.creatorROBERTO AMBROSIO
dc.date2008
dc.date.accessioned2023-07-25T16:23:17Z
dc.date.available2023-07-25T16:23:17Z
dc.identifierhttp://inaoe.repositorioinstitucional.mx/jspui/handle/1009/1247
dc.identifier.urihttps://repositorioslatinoamericanos.uchile.cl/handle/2250/7806444
dc.descriptionIn this work we present the process flow for the fabrication of un-cooled IR detectors employing surface micro-machining techniques over silicon substrates. These detectors are based on thin films deposited by plasma at low temperatures. The thermo sensing film used is an intrinsic a-SixGe1-x:H film, which has demonstrated a very high temperature coefficient of resistance (TCR), and a moderated resistivity, these properties are better than those of the a-Si:H intrinsic film, which is commonly used in commercial IR devices. Two device configurations have been designed and fabricated, labeled planar and sandwich. The former is the configuration commonly used in commercial micro-bolometers, while the latter is proposed in order to reduce the high cell resistance observed in this kind of devices, without the necessity of doping the intrinsic film, which results in a decrement of the TCR and therefore in responsivity. Finally some performance characteristics of the devices studied are discussed in comparison with data reported in literature.
dc.formatapplication/pdf
dc.languageeng
dc.publisherWorld Scientific Publishing Company
dc.relationcitation:Moreno-Moreno, M. , et al., (2008). Microbolometers fabricated with surface micromachining with a-Si-Ge:H thermo-sensing films, International Journal of High Speed Electronics and Systems Vol. 18, (4): 1045–1054
dc.rightsinfo:eu-repo/semantics/openAccess
dc.rightshttp://creativecommons.org/licenses/by-nc-nd/4.0
dc.subjectinfo:eu-repo/classification/Germanium/Germanium
dc.subjectinfo:eu-repo/classification/IR detectors/IR detectors
dc.subjectinfo:eu-repo/classification/Plasma enhanced chemical vapor deposition/Plasma enhanced chemical vapor deposition
dc.subjectinfo:eu-repo/classification/cti/1
dc.subjectinfo:eu-repo/classification/cti/22
dc.subjectinfo:eu-repo/classification/cti/2203
dc.subjectinfo:eu-repo/classification/cti/2203
dc.titleMicrobolometers fabricated with surface micromachining with a-Si-Ge:H thermo-sensing films
dc.typeinfo:eu-repo/semantics/article
dc.typeinfo:eu-repo/semantics/acceptedVersion
dc.audiencestudents
dc.audienceresearchers
dc.audiencegeneralPublic


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