dc.creatorMARIANO ACEVES MIJARES
dc.date2008
dc.date.accessioned2023-07-25T16:22:53Z
dc.date.available2023-07-25T16:22:53Z
dc.identifierhttp://inaoe.repositorioinstitucional.mx/jspui/handle/1009/1054
dc.identifier.urihttps://repositorioslatinoamericanos.uchile.cl/handle/2250/7806253
dc.descriptionElectrical properties of silicon nanoparticles (Si-np’s) embedded in a silicon oxide matrix were studied using MOS-like structures. Si-np’s were created after silicon rich oxide (SRO) films were thermally annealed at 1100 ºC. Capacitance– voltage (C–V) characteristics showed downward and upward peaks in the accumulation region. Current–voltage (I–V) measurements exhibited current valleys and downward and upward peaks. Current versus time (I–t) measurements were also done at a negative constant gate voltage. A switching behaviour between two current states (ON and OFF) was observed. These effects have been related to the charge trapping and de-trapping of the Si-np’s embedded in the SRO films.
dc.formatapplication/pdf
dc.languageeng
dc.publisherWILEY-VCH Verlag GmbH & Co. KGaA, Weinheim
dc.relationcitation:Morales-Sánchez, A., et al., (2008). Charge trapping and de-trapping in Si-nanoparticles embedded in silicon oxide films, Physica Status Solidi 5, (12): 3651–3654
dc.rightsinfo:eu-repo/semantics/openAccess
dc.rightshttp://creativecommons.org/licenses/by-nc-nd/4.0
dc.subjectinfo:eu-repo/classification/cti/1
dc.subjectinfo:eu-repo/classification/cti/22
dc.subjectinfo:eu-repo/classification/cti/2203
dc.subjectinfo:eu-repo/classification/cti/2203
dc.titleCharge trapping and de-trapping in Si-nanoparticles embedded in silicon oxide films
dc.typeinfo:eu-repo/semantics/article
dc.typeinfo:eu-repo/semantics/acceptedVersion
dc.audiencestudents
dc.audienceresearchers
dc.audiencegeneralPublic


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