dc.contributorLIBRADO ARTURO SARMIENTO REYES
dc.contributorEDMUNDO ANTONIO GUTIERREZ DOMINGUEZ
dc.creatorGABRIELA ALEJANDRA RODRIGUEZ RUIZ
dc.date2015-02
dc.date.accessioned2023-07-25T16:20:56Z
dc.date.available2023-07-25T16:20:56Z
dc.identifierhttp://inaoe.repositorioinstitucional.mx/jspui/handle/1009/125
dc.identifier.urihttps://repositorioslatinoamericanos.uchile.cl/handle/2250/7805346
dc.descriptionThe development of a 2D numerical simulation methodology that accounts for thermal and magnetic effects on the gate tunneling current of nano-scaled MOSFETs, is the main goal of this thesis. The Schrödinger-Poisson coupled equation system is modified to account for the influence of a static magnetic field. The wavefunctions, which are the solution to the Schrödinger-Poisson coupled equation system, and the energy, are then obtained as a function of the magnetic field and temperature. Then, by considering open boundary conditions with the Perfectly Matched Layer-PML method and using the Tsu-Esaki direct tunneling model, the gate tunneling current under the influence of a magnetic field and temperature is calculated. By modifying the source files of the commercial GTS Framework device simulation tool to incorporate the new simulation methodology, the gate tunneling current is computed as a function of electrical bias, temperature and magnetic field. By doing so, and by sweeping the magnetic field from negative to positive values, it is found out that electrical charges tunneling, through the gate oxide, from the semiconductor to the gate terminal, are swept from left to right. Therefore, the proposed simulation methodology, accompanied with experimental results, is a very valuable tool to investigate non-homogeneous space distributed tunneling properties.
dc.formatapplication/pdf
dc.languageeng
dc.publisherInstituto Nacional de Astrofísica, Óptica y Electrónica
dc.relationcitation:Rodriguez-Ruiz G.A.
dc.rightsinfo:eu-repo/semantics/openAccess
dc.rightshttp://creativecommons.org/licenses/by-nc-nd/4.0
dc.subjectinfo:eu-repo/classification/Modelos de dispositivos semiconductores/Semiconductor device models
dc.subjectinfo:eu-repo/classification/Túnel magnético/Magnetic tunneling
dc.subjectinfo:eu-repo/classification/Nanoelectrónica/Nanoelectronics
dc.subjectinfo:eu-repo/classification/cti/1
dc.subjectinfo:eu-repo/classification/cti/22
dc.subjectinfo:eu-repo/classification/cti/2203
dc.subjectinfo:eu-repo/classification/cti/2203
dc.titleA 2D simulation methodology for thermo-magnetics effects on tunneling mechanisms of nano-scaled MOS devices
dc.typeinfo:eu-repo/semantics/doctoralThesis
dc.audiencegeneralPublic


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