Annealing Effect on the Structural and Optical properties of SiOx films deposited by HFCVD

dc.creatorJorge Alberto Luna López
dc.creatorALFREDO BENITEZ LARA
dc.creatorGODOFREDO GARCIA SALGADO
dc.creatorJOSE ALVARO DAVID HERNANDEZ DE LA LUZ
dc.creatorAlfredo Morales Sánchez
dc.creatorSERGIO ALFONSO PEREZ GARCIA
dc.date2014-09
dc.date.accessioned2023-07-21T15:32:20Z
dc.date.available2023-07-21T15:32:20Z
dc.identifierhttp://cimav.repositorioinstitucional.mx/jspui/handle/1004/2549
dc.identifier.urihttps://repositorioslatinoamericanos.uchile.cl/handle/2250/7728436
dc.formatapplication/pdf
dc.languagespa
dc.rightsinfo:eu-repo/semantics/openAccess
dc.rightshttp://creativecommons.org/licenses/by-nc/4.0
dc.subjectinfo:eu-repo/classification/cti/7
dc.subjectinfo:eu-repo/classification/cti/7
dc.titleAnnealing Effect on the Structural and Optical properties of SiOx films deposited by HFCVD
dc.typeinfo:eu-repo/semantics/article
dc.typeinfo:eu-repo/semantics/publishedVersion


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