dc.creatorSuarez, Maria Patricia
dc.creatorMirabella, D. A.
dc.creatorAldao, Celso Manuel
dc.date.accessioned2019-01-14T14:23:45Z
dc.date.accessioned2022-10-15T09:31:36Z
dc.date.available2019-01-14T14:23:45Z
dc.date.available2022-10-15T09:31:36Z
dc.date.created2019-01-14T14:23:45Z
dc.date.issued2008-02-19
dc.identifierSuarez, Maria Patricia; Mirabella, D. A.; Aldao, Celso Manuel; Dynamics of hillocks formation during wet etching; Elsevier Science; Journal of Molecular Catalysis A: Chemical; 281; 1-2; 19-2-2008; 230-236
dc.identifier1381-1169
dc.identifierhttp://hdl.handle.net/11336/67970
dc.identifierCONICET Digital
dc.identifierCONICET
dc.identifier.urihttps://repositorioslatinoamericanos.uchile.cl/handle/2250/4370665
dc.description.abstractEtch hillocks formation was studied experimentally and modeled using the Monte Carlo method. Simulations were used to explore the consequences of site-dependent detachment probabilities on surface morphology for a one- and two-dimensional substrate models. Comparison with pyramidal etch hillocks that are regularly observed in anisotropic etching of Si(1 0 0) are presented. The steady-state morphologies are analyzed and the hillock size distributions determined. The mechanisms responsible for the steady-state morphologies are described.
dc.languageeng
dc.publisherElsevier Science
dc.relationinfo:eu-repo/semantics/altIdentifier/url/https://www.sciencedirect.com/science/article/pii/S1381116907004918?via%3Dihub
dc.relationinfo:eu-repo/semantics/altIdentifier/doi/http://dx.doi.org/10.1016/j.molcata.2007.08.012
dc.rightshttps://creativecommons.org/licenses/by-nc-nd/2.5/ar/
dc.rightsinfo:eu-repo/semantics/restrictedAccess
dc.subjectETCHING
dc.subjectMONTE CARLO SIMULATIONS
dc.subjectROUGHNESS AND TOPOGRAPHY
dc.subjectSCANNING ELECTRON MICROSCOPY
dc.titleDynamics of hillocks formation during wet etching
dc.typeinfo:eu-repo/semantics/article
dc.typeinfo:ar-repo/semantics/artículo
dc.typeinfo:eu-repo/semantics/publishedVersion


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