dc.creator | Haberkorn, Nestor Fabian | |
dc.creator | Hofer, Juan Andres | |
dc.date.accessioned | 2020-03-25T14:51:54Z | |
dc.date.accessioned | 2022-10-15T05:49:29Z | |
dc.date.available | 2020-03-25T14:51:54Z | |
dc.date.available | 2022-10-15T05:49:29Z | |
dc.date.created | 2020-03-25T14:51:54Z | |
dc.date.issued | 2018-11 | |
dc.identifier | Haberkorn, Nestor Fabian; Hofer, Juan Andres; Thermally activated flux creep in nanocrystalline δ-MoN thin films; Pergamon-Elsevier Science Ltd; Solid State Communications; 283; 11-2018; 47-51 | |
dc.identifier | 0038-1098 | |
dc.identifier | http://hdl.handle.net/11336/100663 | |
dc.identifier | CONICET Digital | |
dc.identifier | CONICET | |
dc.identifier.uri | https://repositorioslatinoamericanos.uchile.cl/handle/2250/4351704 | |
dc.description.abstract | We study the vortex dynamics in a nanocrystalline 420 nm thick δ-MoN film on Si (100). The film was grown at room temperature by reactive sputtering and following it is crystallized by thermal annealing at 973 K for one hour. The microstructure shows grains with sizes between 30 nm and 65 nm. The film displays a Tc of 11.2 K. The magnetic field dependence of the critical current density Jc at intermediate and low fields (related to the upper critical field) displays a power-law regime. The self-field Jc at 4.5 K is ≈2 MA cm−2. The pinning force Fp exhibits a maximum at h ≈ 0.3, which is in agreement with vortex pinning produced by grain boundaries. An Anderson-Kim mechanism describes the temperature dependence of the flux creep rates. The U0 values range from ≈2500 K for μ0H = 0.02 T to ≈1300 K for μ0H = 0.5 T. | |
dc.language | eng | |
dc.publisher | Pergamon-Elsevier Science Ltd | |
dc.relation | info:eu-repo/semantics/altIdentifier/url/https://www.sciencedirect.com/science/article/pii/S0038109818304721 | |
dc.relation | info:eu-repo/semantics/altIdentifier/doi/http://dx.doi.org/10.1016/j.ssc.2018.08.017 | |
dc.rights | https://creativecommons.org/licenses/by-nc-sa/2.5/ar/ | |
dc.rights | info:eu-repo/semantics/restrictedAccess | |
dc.subject | A. SUPERCONDUCTORS | |
dc.subject | B. SPUTTERING | |
dc.subject | D. CRITICAL CURRENT DENSITIES | |
dc.subject | D. FLUX CREEP RELAXATION | |
dc.title | Thermally activated flux creep in nanocrystalline δ-MoN thin films | |
dc.type | info:eu-repo/semantics/article | |
dc.type | info:ar-repo/semantics/artículo | |
dc.type | info:eu-repo/semantics/publishedVersion | |