dc.creatorPapurello, Rocio
dc.creatorLozano Solórzano, Luis Alejandro
dc.creatorRamos-Fernández, Enrique V.
dc.creatorFernandez, Jose Luis
dc.creatorZamaro, Juan Manuel
dc.date.accessioned2020-11-26T16:10:57Z
dc.date.accessioned2022-10-15T04:07:25Z
dc.date.available2020-11-26T16:10:57Z
dc.date.available2022-10-15T04:07:25Z
dc.date.created2020-11-26T16:10:57Z
dc.date.issued2019-09
dc.identifierPapurello, Rocio; Lozano Solórzano, Luis Alejandro; Ramos-Fernández, Enrique V.; Fernandez, Jose Luis; Zamaro, Juan Manuel; Post-Synthetic Modification of ZIF-8 Crystals and Films through UV Light Photoirradiation: Impact on the Physicochemical Behavior of the MOF; Wiley VCH Verlag; Chemphyschem; 20; 9-2019; 1-10
dc.identifier1439-4235
dc.identifierhttp://hdl.handle.net/11336/119133
dc.identifierCONICET Digital
dc.identifierCONICET
dc.identifier.urihttps://repositorioslatinoamericanos.uchile.cl/handle/2250/4343442
dc.description.abstractThe physicochemical modification of Metal-Organic Frameworks (MOFs) is a current challenge in the search to improve their performance in different technological applications. In this work we analyze the post-synthetic modification of ZIF-8 crystals and films through a simple and clean treatment that involves the exposure to a UV lamp under environmental conditions. It is demonstrated that a short treatment alters the MOF structure and chemistry, providing a modified ZIF-8 due to partial disconnections of its structure which increase the amount of terminal surface species such as Zn OH and C=N-H, but without compromising the overall MOF structure, specific surface area or thermal stability. Additionally, it leads to changes in several properties of the ZIF-8, such as its capacity to accumulate charge through pseudocapacitive processes, its interaction with nitric oxide and its light absorption behavior. This strategy of modifying ZIF-8 without the use of chemicals through a gentle disconnection of its own structure could open new perspectives of post-functionalization of crystals and films of ZIF-8 to be used in a wide range of applications.
dc.languageeng
dc.publisherWiley VCH Verlag
dc.relationinfo:eu-repo/semantics/altIdentifier/doi/http://dx.doi.org/10.1002/cphc.201900863
dc.rightshttps://creativecommons.org/licenses/by-nc-sa/2.5/ar/
dc.rightsinfo:eu-repo/semantics/restrictedAccess
dc.subjectPOST-SYNTHETIC MODIFICATIONS
dc.subjectSURFACE PROPERTIES
dc.subjectULTRAVIOLET LIGHT
dc.subjectZEOLITIC IMIDAZOLATE FRAMEWORKS
dc.subjectZIF-8
dc.titlePost-Synthetic Modification of ZIF-8 Crystals and Films through UV Light Photoirradiation: Impact on the Physicochemical Behavior of the MOF
dc.typeinfo:eu-repo/semantics/article
dc.typeinfo:ar-repo/semantics/artículo
dc.typeinfo:eu-repo/semantics/publishedVersion


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