Argentina
| info:eu-repo/semantics/article
Pressure dependence of the silicon carbide synthesis temperature
dc.creator | Limandri, Silvina Paola | |
dc.creator | Garbarino, G. | |
dc.creator | Sifre, D. | |
dc.creator | Mezouar, M. | |
dc.creator | Galván Josa, Víctor Martín | |
dc.date.accessioned | 2021-02-04T20:26:18Z | |
dc.date.accessioned | 2022-10-15T03:59:49Z | |
dc.date.available | 2021-02-04T20:26:18Z | |
dc.date.available | 2022-10-15T03:59:49Z | |
dc.date.created | 2021-02-04T20:26:18Z | |
dc.date.issued | 2019-04-26 | |
dc.identifier | Limandri, Silvina Paola; Garbarino, G.; Sifre, D.; Mezouar, M.; Galván Josa, Víctor Martín; Pressure dependence of the silicon carbide synthesis temperature; American Institute of Physics; Journal of Applied Physics; 125; 16; 26-4-2019; 165902 | |
dc.identifier | 0021-8979 | |
dc.identifier | http://hdl.handle.net/11336/124878 | |
dc.identifier | CONICET Digital | |
dc.identifier | CONICET | |
dc.identifier.uri | https://repositorioslatinoamericanos.uchile.cl/handle/2250/4343018 | |
dc.description.abstract | The starting temperature for SiC synthesis from elemental silicon, carbon black, and graphite powders was determined for pressures ranging from 0.8 to 11 GPa by in situ X-ray diffraction experiments. The synthesized SiC corresponds to the cubic 3C phase with the presence of stacking faults along the [111] direction. The lowest density of the stacking faults is achieved when black carbon is used instead of graphite. The minimum temperature to start the Si + C → SiC reaction slightly decreases when the pressure is increased up to 6 GPa and the reaction begins before silicon melts. For pressures higher than 8 GPa, the starting temperature increases, and the formation of SiC from the SiII phase requires the complete melting of silicon. Bulk modulus Bo= 236(14) GPa was obtained for the synthesized SiC phase. | |
dc.language | eng | |
dc.publisher | American Institute of Physics | |
dc.relation | info:eu-repo/semantics/altIdentifier/url/https://aip.scitation.org/doi/10.1063/1.5085839 | |
dc.relation | info:eu-repo/semantics/altIdentifier/doi/http://dx.doi.org/10.1063/1.5085839 | |
dc.rights | https://creativecommons.org/licenses/by-nc-sa/2.5/ar/ | |
dc.rights | info:eu-repo/semantics/openAccess | |
dc.subject | SILICON CARBIDE | |
dc.subject | HIGH PRESSURE | |
dc.subject | X RAY DIFFRACTION | |
dc.title | Pressure dependence of the silicon carbide synthesis temperature | |
dc.type | info:eu-repo/semantics/article | |
dc.type | info:ar-repo/semantics/artículo | |
dc.type | info:eu-repo/semantics/publishedVersion |