dc.creatorVu, Giang Thi
dc.creatorAbate, Anabella Angela
dc.creatorGomez, Leopoldo Raimundo
dc.creatorPezzutti, Aldo Daniel
dc.creatorRegister, Richard A.
dc.creatorVega, Daniel Alberto
dc.creatorSchmid, Friederike
dc.date.accessioned2019-12-18T18:14:54Z
dc.date.accessioned2022-10-15T02:14:04Z
dc.date.available2019-12-18T18:14:54Z
dc.date.available2022-10-15T02:14:04Z
dc.date.created2019-12-18T18:14:54Z
dc.date.issued2018-08-21
dc.identifierVu, Giang Thi; Abate, Anabella Angela; Gomez, Leopoldo Raimundo; Pezzutti, Aldo Daniel; Register, Richard A.; et al.; Curvature as a Guiding Field for Patterns in Thin Block Copolymer Films; American Physical Society; Physical Review Letters; 121; 8; 21-8-2018; 878011-878016
dc.identifier0031-9007
dc.identifierhttp://hdl.handle.net/11336/92493
dc.identifierCONICET Digital
dc.identifierCONICET
dc.identifier.urihttps://repositorioslatinoamericanos.uchile.cl/handle/2250/4334001
dc.description.abstractExperimental data on thin films of cylinder-forming block copolymers (BC)—free-standing BCmembranes as well as supported BC films—strongly suggest that the local orientation of the BC patternsis coupled to the geometry in which the patterns are embedded. We analyze this phenomenon using generalsymmetry considerations and numerical self-consistent field studies of curved BC films in cylindricalgeometry. The stability of the films against curvature-induced dewetting is also analyzed. In goodagreement with experiments, we find that the BC cylinders tend to align along the direction of curvature athigh curvatures. At low curvatures, we identify a transition from perpendicular to parallel alignment insupported films, which is absent in free-standing membranes. Hence both experiments and theory show thatcurvature can be used to manipulate and align BC patterns.
dc.languageeng
dc.publisherAmerican Physical Society
dc.relationinfo:eu-repo/semantics/altIdentifier/url/https://journals.aps.org/prl/abstract/10.1103/PhysRevLett.121.087801
dc.relationinfo:eu-repo/semantics/altIdentifier/doi/http://dx.doi.org/10.1103/PhysRevLett.121.087801
dc.relationinfo:eu-repo/semantics/altIdentifier/url/https://arxiv.org/abs/1802.10005
dc.rightshttps://creativecommons.org/licenses/by/2.5/ar/
dc.rightsinfo:eu-repo/semantics/openAccess
dc.subjectCOPOLYMERS
dc.subjectBUCKLING
dc.subjectTOPOLOGICAL DEFECTS
dc.titleCurvature as a Guiding Field for Patterns in Thin Block Copolymer Films
dc.typeinfo:eu-repo/semantics/article
dc.typeinfo:ar-repo/semantics/artículo
dc.typeinfo:eu-repo/semantics/publishedVersion


Este ítem pertenece a la siguiente institución