| dc.creator | MARIANO ACEVES MIJARES | |
| dc.creator | JOSE ALBERTO LUNA LOPEZ | |
| dc.date | 2007-03 | |
| dc.date.accessioned | 2022-10-12T19:41:53Z | |
| dc.date.available | 2022-10-12T19:41:53Z | |
| dc.identifier | http://inaoe.repositorioinstitucional.mx/jspui/handle/1009/976 | |
| dc.identifier.uri | https://repositorioslatinoamericanos.uchile.cl/handle/2250/4119948 | |
| dc.description | Silicon rich oxide (SRO) films with different silicon excess were deposited by low pressure chemical vapor deposition (LPCVD) using SiH4 and N2O as the reactant gasses. A set of SRO films was implanted with silicon ions (SI-SRO). After thermal annealing, SRO and SI-SRO films with low Si excess showed a strong visible photoluminescence (PL) in the 1.4–2.1 eV range, characteristic of silicon nanocrystals (Si-nc’s) formation.
For SRO layers, a redshift of the PL peak was only observed by increasing the silicon excess from 4 to 5.1 at. %, no redshift took place when the silicon excess was 12.7 at. %. The SI-SRO films exhibited a similar behaviour. For implanted and non implanted samples, transmission electron microscopy analysis only showed silicon clusters when the silicon excess was higher than 5 at. %. It has been observed that the Si-clusters size was larger as the silicon excess increased and that the Si-clusters density increased when the SRO films were implanted. Therefore, a stronger PL response was observed in the SI-SRO films. The structural and optical properties of SRO and SI-SRO films have been related, suggesting that the emission could be associated to Si-clusters/defects interaction. | |
| dc.format | application/pdf | |
| dc.language | eng | |
| dc.publisher | Elsevier B.V. | |
| dc.publisher | Science Direct | |
| dc.relation | citation:Morales-Sánchez, A., et al., (2007). Optical characterization of silicon rich oxide films, Sensors and Actuators A 142 (2008): 12–18 | |
| dc.rights | info:eu-repo/semantics/openAccess | |
| dc.rights | http://creativecommons.org/licenses/by-nc-nd/4.0 | |
| dc.subject | info:eu-repo/classification/Silicon rich oxide/Silicon rich oxide | |
| dc.subject | info:eu-repo/classification/Silicon clusters/Silicon clusters | |
| dc.subject | info:eu-repo/classification/Photoluminescence/Photoluminescence | |
| dc.subject | info:eu-repo/classification/FTIR/FTIR | |
| dc.subject | info:eu-repo/classification/XPS/XPS | |
| dc.subject | info:eu-repo/classification/EFTEM/EFTEM | |
| dc.subject | info:eu-repo/classification/cti/1 | |
| dc.subject | info:eu-repo/classification/cti/22 | |
| dc.subject | info:eu-repo/classification/cti/2203 | |
| dc.title | Optical characterization of silicon rich oxide films | |
| dc.type | info:eu-repo/semantics/article | |
| dc.type | info:eu-repo/semantics/acceptedVersion | |
| dc.audience | students | |
| dc.audience | researchers | |
| dc.audience | generalPublic | |
