Optical-electrical properties and thickness analysis of TiO2 thin films obtained by magnetron sputtering

dc.creatorFeitor, Michelle Cerqueira
dc.creatorS. Sobrinho, V. S.
dc.creatorMiranda Neto, José Queiroz de
dc.creatorLima, L. L. F.
dc.creatorSouza, Iedo A
dc.creatorLibório, Maxwell Santana
dc.creatorQueiroz, José César Augusto de
dc.creatorSousa, Rômulo Ribeiro Magalhães de
dc.creatorAlmeida, Érika Oliveira de
dc.creatorCosta, Thércio Henrique de Carvalho
dc.date2022-01-05T13:34:04Z
dc.date2020-09-23
dc.identifierS. SOBRINHO, V. S.; M. NETO, J.Q.; LIMA, L.L.F.; SOUZA, I.A.; LIBÓRIO, M.S.; QUEIROZ, J.C.A.; SOUSA, R.R.M.; ALMEIDA, E.O.; FEITOR, M.C.; COSTA, T.H.C.. Optical-Electrical Properties and Thickness Analysis of TiO2 Thin Films Obtained by Magnetron Sputtering. Brazilian Journal of Physics, [S.l.], v. 50, n. 6, p. 771-779, 23 set. 2020. Disponível em: https://link.springer.com/article/10.1007%2Fs13538-020-00794-3. Acesso em: 14 abr. 2021. http://dx.doi.org/10.1007/s13538-020-00794-3.
dc.identifier0103-9733
dc.identifier1678-4448
dc.identifierhttps://repositorio.ufrn.br/handle/123456789/45566
dc.identifier10.1007/s13538-020-00794-3
dc.descriptionThe study of thin films with properties that meet specific needs and improve people’s quality of life has been the focus of many researchers. However, knowing and controlling the production techniques of these films have been a challenge for the industry of optical-electronic devices, functional coatings, and energy conservation. The thickness of thin films is a parameter that influences the optical and electrical characteristics of these materials, thus being one of the most important information in the plasma deposition process. Because of the need for precision in measuring the thickness of thin transparent films, this work proposes to evaluate the Swanepoel methods (envelope) and the PUMA, computational method, from optical transmittance curves and compare them with the measurements directly made by microscopy. Scanning electronics for thin films of TiO2 deposited by magnetron sputtering in different conditions. The results of this study showed that the PUMA method is capable of calculating film thicknesses of a few hundred nanometers and with few interference fringes. The PUMA method showed convergence with high precision for films produced with 30 and 60 min of treatment and a difference of 17% for films with 120 min of deposition concerning the measurements made by microscopy
dc.description2030-12
dc.formatapplication/pdf
dc.languageen
dc.publisherSpringer Science and Business Media LLC
dc.rightsAttribution 3.0 Brazil
dc.rightshttp://creativecommons.org/licenses/by/3.0/br/
dc.rightsLOCKSS system has permission to collect, preserve, and serve this Archival Unit
dc.subjectThin films
dc.subjectMagnetron sputtering
dc.subjectSwanepoel method
dc.subjectPUMA
dc.subjectTransmittance
dc.titleOptical-electrical properties and thickness analysis of TiO2 thin films obtained by magnetron sputtering
dc.typearticle


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