The effect of pulse width on the microstructure of d.c.-plasma-nitrided layers

dc.creatorAlves Júnior, Clodomiro
dc.creatorRodrigues, José de Anchieta
dc.creatorMartinelli, Antonio Eduardo
dc.date.accessioned2021-02-10T20:33:15Z
dc.date.accessioned2022-10-06T14:02:27Z
dc.date.available2021-02-10T20:33:15Z
dc.date.available2022-10-06T14:02:27Z
dc.date.created2021-02-10T20:33:15Z
dc.date.issued1999-12-15
dc.identifierALVES, C; RODRIGUES, J.A; MARTINELLI, A.E. The effect of pulse width on the microstructure of d.c.-plasma-nitrided layers. Surface And Coatings Technology, [S.L.], v. 122, n. 2-3, p. 112-117, dez. 1999. Disponível em: https://www.sciencedirect.com/science/article/abs/pii/S0257897299003266?via%3Dihub. Acesso em: 26 nov. 2020. http://dx.doi.org/10.1016/s0257-8972(99)00326-6.
dc.identifier0257-8972
dc.identifierhttps://repositorio.ufrn.br/handle/123456789/31472
dc.identifier10.1016/S0257-8972(99)00326-6
dc.identifier.urihttp://repositorioslatinoamericanos.uchile.cl/handle/2250/3974514
dc.publisherElsevier
dc.rightshttp://creativecommons.org/licenses/by/3.0/br/
dc.rightsAttribution 3.0 Brazil
dc.subjectIon bombardment
dc.subjectPulsed plasma
dc.subjectPlasma nitriding
dc.titleThe effect of pulse width on the microstructure of d.c.-plasma-nitrided layers
dc.typearticle


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