dc.creatorCarriço, Artur da Silva
dc.creatorBarrio, R. A.
dc.creatorElliot, R. J.
dc.date2020-03-26T19:33:48Z
dc.date2020-03-26T19:33:48Z
dc.date1986
dc.identifierELLIOT, R J; BARRIO, R. A.; CARRIÇO, Artur da Silva. Modelling the Raman spectrum of the amorphous-crystal Si system. Journal of Physics C: Solid State Physics, v. 19, n. 8, p. 1113-1122, 1986. Disponível em: http://iopscience.iop.org/article/10.1088/0022-3719/19/8/010/meta Acesso em 26.fev. 2018.
dc.identifierhttps://repositorio.ufrn.br/jspui/handle/123456789/28673
dc.identifierhttps://doi.org/10.1088/0022-3719/19/8/010
dc.descriptionA model to calculate the Raman response of small Si crystallites immersed in an amorphous Si matrix is developed. The structure of the system is modelled by an infinite crystalline slab of varying width, in which the atoms on the (111) surfaces on both sides of the slab are attached to Bethe lattices. The Raman response is obtained from a simple polarisability model using the Green function technique. The results are compared with recent experiments. The model can be used for Si crystallites with free and hydrogenated (111) surfaces.
dc.languageen
dc.publisherInstitute of Physics (the “Institute”) and IOPscience
dc.publisherIOP Publishing
dc.subjectModelagem do espectro Raman do sistema Si-cristal amorfo
dc.titleModelling the raman spectrum of the amorphous- crystal Si system
dc.typearticle


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