Trabalho apresentado em evento
Erbium-activated HfO2-based waveguides for photonics
Fecha
2003-12-01Registro en:
Proceedings of SPIE - The International Society for Optical Engineering, v. 4829 I, p. 89-90.
0277-786X
10.1117/12.524944
2-s2.0-2342529081
2998503841917815
Autor
Université di Trento
Ist. di Fotonica e Nanotecnologie
Università di Trento
Ist. di Fis. Applicata Nello Carrara
Universidade Estadual Paulista (Unesp)
Resumen
70SiO2 - 30HfO2 planar waveguides, activated by Er3+ concentration ranging from 0.3 to 1 mol%, were prepared by solgel route, using dip-coating deposition on silica glass substrates. The waveguides showed high densification degree, effective intermingling of the two components of the film, and uniform surface morphology. Propagation losses of about 1 dB/cm were measured at 632.8 nm. When pumped with 987 nm or 514.5 nm continuous-wave laser light, the waveguides showed the 4I 13/2→4I15/2 emission band with a bandwidth of 48 nm. The spectral features were found independent both on erbium content and excitation wavelength. The 4I13/2 level decay curves presented a single exponential profile, with a lifetime between 2.9-5.0 ms, depending on the erbium concentration.